Method and device for exposure of photosensitive layer

Patent metadata

Field	Value
Publication number	US-10852528-B2
Application number	US-201616464838-A
Country	US
Kind code	B2
Filing date	Dec 20, 2016
Priority date	Dec 20, 2016
Publication date	Dec 1, 2020
Grant date	Dec 1, 2020

Abstract

A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.

First claim

Having described the invention, the following is claimed:

1. A method for exposing a light-sensitive layer to light using an optical system, said method comprising:
directing at least one light beam generated by at least one light source, respectively, to at least one micro-mirror device having one or more micro-mirrors to respectively illuminate one or more pixels to generate an image of the micro-mirror device; and
effecting, via two cylinder lenses, a shearing of the generated image to form horizontal and/or vertical exposure pattern grid lines of a pattern grid to which the light-sensitive layer is exposed, each of the cylinder lenses having a cylinder axis,
wherein greater than 50% of an energy of each of the pixels is found in a field of the light-sensitive layer having an image that directly corresponds with the pixel, and
wherein a remaining amount of the energy of each of the pixels is distributed across adjacent fields to the field having the image that directly corresponds with the pixel.

2. The method according to claim 1 , wherein the method includes arranging the horizontal and/or vertical exposure pattern grid lines obliquely.

3. The method of claim 1 , wherein the two cylinder lenses are combined to form a compound lens.

4. A device for exposing a light-sensitive layer to light, the device comprising:
at least one light source for respectively generating at least one light beam,
at least one micro-mirror device toward which the light beam is directed by the light source, the micro-mirror device having one or more micro-mirrors configured to respectively illuminate one or more pixels to generate an image of the micro-mirror device,
two cylinder lenses, each cylinder lens having a cylinder axis, the cylinder lenses being configured to effect a shearing of the generated image to form horizontal and/or vertical exposure pattern grid lines of a pattern grid to which the light-sensitive layer is exposed,
wherein greater than 50% of an energy of each of the pixels is found in a field of the light-sensitive layer having an image that directly corresponds with the pixel, and
wherein a remaining amount of the energy of each of the pixels is distributed across adjacent fields to the field having the image that directly corresponds with the pixel.

5. The device of claim 4 , wherein the two cylinder lenses are combined to form a compound lens.

Assignees

• Ev Group E Thallner Gmbh

Inventors

• Thallner Bernhard
• Povazay Boris

Classifications

• G03F7/70575

  Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength · CPC title

• G03F7/70291

  Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices · CPC title

• G03F7/7005

  by multiple sources, e.g. light-emitting diodes [LED] or light source arrays (addressable array sources specially adapted to produce patterns without a mask G03F7/70391) · CPC title

• G03F7/213

  Exposing with the same light pattern different positions of the same surface at the same time {(G03F7/70 takes precedence)} · CPC title

• G03F7/2057

  using an addressed light valve, e.g. a liquid crystal device · CPC title