Pattern forming method, resist material, and pattern forming apparatus
US-12449737-B2 · Oct 21, 2025 · US
characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/0125 |
| Official title | {characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides} |
| Display label | characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides |
| Total patents | 31 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 3 |
| 2016 | 3 |
| 2017 | 3 |
| 2018 | 5 |
| 2019 | 3 |
| 2020 | 4 |
| 2021 | 2 |
| 2022 | 1 |
| 2023 | 1 |
| 2024 | 3 |
| 2025 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Photoresist composition and method of forming photoresist pattern
US-2025164881-A1 · May 22, 2025 · US
Photoresist composition and method of forming photoresist pattern
US-12222647-B2 · Feb 11, 2025 · US
Polyimides having low dielectric loss
US-2024166818-A1 · May 23, 2024 · US
Polyimides having low dielectric loss
US-2024150524-A1 · May 9, 2024 · US
Photoresist composition and method of forming photoresist pattern
US-11971659-B2 · Apr 30, 2024 · US
Photoresist composition and method of forming photoresist pattern
US-2023028673-A1 · Jan 26, 2023 · US
Pattern forming method, resist material, and pattern forming apparatus
US-2022365448-A1 · Nov 17, 2022 · US
Photosensitive resin composition, photosensitive dry film, and pattern forming process
US-11187982-B2 · Nov 30, 2021 · US
Photosensitive compositions, color filter and microlens derived therefrom
US-10915019-B2 · Feb 9, 2021 · US
Photoresist composition and method of forming photoresist pattern
US-2020272051-A1 · Aug 27, 2020 · US
Resist composition, method of forming resist pattern, compound, and acid generator
US-10649330-B2 · May 12, 2020 · US
Photosensitive resin composition, photosensitive dry film, and pattern forming process
US-2020117089-A1 · Apr 16, 2020 · US
Photoresist composition for line doubling
US-2020012188-A1 · Jan 9, 2020 · US
Photosensitive composition and organic thin-film transistor
US-2019250510-A1 · Aug 15, 2019 · US
Photosensitive composition and organic thin-film transistor
US-2019250509-A1 · Aug 15, 2019 · US
Curable composition for permanent resist films, and permanent resist film
US-10179828-B2 · Jan 15, 2019 · US
Heat-Sensitive Recording Material
US-2018345710-A1 · Dec 6, 2018 · US
Method for direct photopatterning of molecules on surfaces
US-10124312-B2 · Nov 13, 2018 · US
Photosensitive compositions, color filter and microlens derived therefrom
US-2018284609-A1 · Oct 4, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/0125?
- CPC G03F7/0125 is the Cooperative Patent Classification code for “characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides.”
- How many patents are filed under CPC G03F7/0125 (characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides)?
- Our database includes 31 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/0125 growing?
- Publication counts under this code: 3 in 2024 vs 3 in 2025 (latest complete years).