Resist composition, method of forming resist pattern, compound, and acid generator

Patent metadata

Field	Value
Publication number	US-10649330-B2
Application number	US-201715822999-A
Country	US
Kind code	B2
Filing date	Nov 27, 2017
Priority date	Nov 29, 2016
Publication date	May 12, 2020
Grant date	May 12, 2020

Abstract

A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein R 01 to R 014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R 01 to R 014 may be mutually bonded to form a ring structure, provided that at least two of R 01 to R 014 are mutually bonded to form a ring structure, and at least one of R 01 to R 014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m).

First claim

What is claimed is:

1. A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid,
the resist composition comprising:
a base component (A) which exhibits changed solubility in a developing solution under action of acid; and
a compound (B1) having an anion moiety and a cation moiety represented by general formula (b1) shown below:

wherein R 01 to R 014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R 01 to R 014 may be mutually bonded to form a ring structure, provided that at least two of R 01 to R 014 are mutually bonded to form a ring structure, and one of R 01 to R 014 has one anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m.

2. The resist composition according to claim 1 , wherein the anion moiety of the compound (B1) is an anion represented by general formula (b1-an1-0) shown below:

wherein R 015 to R 020 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R 015 to R 020 may be mutually bonded to form a ring structure, provided that one of R 015 to R 020 has one anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; R 021 represents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, a carbonyl group or a nitro group; n1 represents an integer of 1 to 3; n11 represents an integer of 0 to 8; R 022 represents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, a carbonyl group or a nitro group; n2 represents an integer of 1 to 3; and n21 represents an integer of 0 to 8.

3. The resist composition according to claim 2 , wherein the compound (B1) is a compound represented by general formula (b1-1) shown below:

wherein R 015 to R 020 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R 015 to R 020 may be mutually bonded to form a ring structure, provided that one of R 015 to R 020 has one anion group represented by general formula (b1-r-an1), and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; R b01 represents a fluorinated alkyl group or a fluorine atom; V b01 represents a alkylene group, a fluorinated alkylene group or a single bond; Y b01 represents a divalent linking group or a single bond; R 021 represents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, a carbonyl group or a nitro group; n1 represents an integer of 1 to 3; n11 represents an integer of 0 to 8; R 022 represents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a hydroxy group, a carbonyl group or a nitro group; n2 represents an integer of 1 to 3; n21 represents an integer of 0 to 8; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m.

4. The resist composition according to claim 1 , wherein the base component (A) comprises a resin component (A1), and
the resin component (A1) comprises a polymeric compound having a structural unit (a1) containing an acid decomposable group that exhibits increased polarity by the action of acid.

5. A method of forming a resist pattern, comprising:
forming a resist composition according to claim 1 ;
exposing the resist film; and
developing the exposed resist film to form a resist pattern.

6. A compound having a cation moiety and an anion moiety, represented by general formula (b1) shown below:

wherein R 01 to R 014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R 01 to R 014 may be mutually bonded to form a ring structure, provided that at least two of R 01 to R 014 are mutually bonded to form an aromatic ring structure, and one of R 01 to R 014 has one anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; m represents an integer of 1 or more; and M m+ represents an organic cation having a valency of m.

7. An acid generator consisting of the compound according to claim 6 .

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Arai Masatoshi
• Maehashi Takaya
• Ikeda Takuya

Classifications

• C08F212/24

  Phenols or alcohols · CPC title

• C08F12/24

  Phenols or alcohols · CPC title

• C07C381/12

  Sulfonium compounds · CPC title

• C07C2603/88

  Ethanoanthracenes; Hydrogenated ethanoanthracenes · CPC title

• G03F7/0397

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title