Polymer For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process
US-2024242967-A1 · Jul 18, 2024 · US
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characterised by the non-macromolecular additives
characterised by the non-macromolecular additives · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/0085 |
| Official title | {characterised by the non-macromolecular additives} |
| Display label | characterised by the non-macromolecular additives |
| Total patents | 18 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly growing.
| Year | Patents |
|---|---|
| 2015 | 4 |
| 2016 | 1 |
| 2017 | 1 |
| 2018 | 1 |
| 2019 | 1 |
| 2020 | 3 |
| 2021 | 3 |
| 2022 | 1 |
| 2024 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Photosensitive composition
US-11953831-B2 · Apr 9, 2024 · US
Three-dimensional crosslinker composition and method of manufacturing electronic devices using the same
US-11860536-B2 · Jan 2, 2024 · US
Photoresist material, method of fabcricating same, and color filter substrate
US-11506975-B2 · Nov 22, 2022 · US
Three-dimensional crosslinker composition and method of manufacturing electronic devices using the same
US-2021397087-A1 · Dec 23, 2021 · US
Photoresist material, method of fabcricating same, and color filter substrate
US-2021216011-A1 · Jul 15, 2021 · US
Tetracarboxylic dianhydride, polyimide resin and method for producing the same, photosensitive resin compositions, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts
US-10919918-B2 · Feb 16, 2021 · US
Photosensitive composition
US-2020393759-A1 · Dec 17, 2020 · US
Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same
US-10732502-B2 · Aug 4, 2020 · US
Photoresist composition for line doubling
US-2020012188-A1 · Jan 9, 2020 · US
Novel tetracarboxylic dianhydride, polyimide resin and method for producing the same, photosensitive resin compositions, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts
US-2019169211-A1 · Jun 6, 2019 · US
Click-chemistry compatible structures, click-chemistry functionalized structures, and materials and methods for making the same
US-2018059541-A1 · Mar 1, 2018 · US
Photoresists and methods for use thereof
US-9665001-B2 · May 30, 2017 · US
Ink Composition for Forming Transparent Conductive Film, Transparent Conductive Film, Method for Producing Transparent Electrode, and Image Display Device
US-2016040023-A1 · Feb 11, 2016 · US
Photosensitive resin composition, protective film and element having the same
US-2015378256-A1 · Dec 31, 2015 · US
Positive photosensitive resin composition and uses thereof
US-9190521-B2 · Nov 17, 2015 · US
Photoinduced alkyne-azide click reactions
US-9176380-B2 · Nov 3, 2015 · US
Photoresist composition and method of manufacturing display device using same
US-8927189-B2 · Jan 6, 2015 · US