Photosensitive composition

US11953831B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11953831-B2
Application numberUS-202017003487-A
CountryUS
Kind codeB2
Filing dateAug 26, 2020
Priority dateMar 5, 2018
Publication dateApr 9, 2024
Grant dateApr 9, 2024

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Provided are a photosensitive composition for pulse exposure including: a coloring material A; a photoradical polymerization initiator B; and a radically polymerizable compound C, in which a content of a radically polymerizable compound C1 having a weight-average molecular weight of 3000 or higher is 70 mass % or higher with respect to a total mass of the radically polymerizable compound C.

First claim

Opening claim text (preview).

What is claimed is: 1. A photosensitive composition for pulse exposure comprising: a coloring material A; a photoradical polymerization initiator B; and a radically polymerizable compound C, wherein a content of a radically polymerizable compound C1 having a weight-average molecular weight of 3000 or higher is 70 mass % or higher with respect to a total mass of the radically polymerizable compound C, and the radically polymerizable compound C1 includes a repeating unit having an ethylenically unsaturated bond group at a side chain and a repeating unit having a graft chain. 2. The photosensitive composition according to claim 1 , wherein the coloring material A is a pigment. 3. The photosensitive composition according to claim 1 , wherein a content of the coloring material A is 50 mass % or higher with respect to a total solid content of the photosensitive composition. 4. The photosensitive composition according to claim 1 , wherein a content of the photoradical polymerization initiator B is 2% to 10 mass % with respect to a total solid content of the photosensitive composition. 5. The photosensitive composition according to claim 1 , wherein a total content of the coloring material A and the radically polymerizable compound C1 is 80 mass % or higher with respect to a total solid content of the photosensitive composition. 6. The photosensitive composition according to claim 1 , wherein a content of the radically polymerizable compound C1 is 60 mass % or higher with respect to a total mass of compounds having a weight-average molecular weight of 3000 or higher in the photosensitive composition, the compounds excluding the coloring material A and the photoradical polymerization initiator B. 7. The photosensitive composition according to claim 1 , wherein the radically polymerizable compound C1 has an acid group. 8. The photosensitive composition according to claim 7 , wherein an acid value of the radically polymerizable compound C1 is 30 to 150 mgKOH/g. 9. The photosensitive composition according to claim 1 , wherein an amount of an ethylenically unsaturated bond group in the radically polymerizable compound C1 is 0.2 to 3.0 mmol/g. 10. The photosensitive composition according to claim 1 , wherein a weight-average molecular weight of the radically polymerizable compound C1 is 5000 to 40000. 11. The photosensitive composition according to claim 1 , wherein the radically polymerizable compound C1 is a dispersant. 12. The photosensitive composition according to claim 1 , wherein the radically polymerizable compound C includes the radically polymerizable compound C1 and a radically polymerizable compound C2 having a molecular weight of lower than 3000, and a content of the radically polymerizable compound C1 is 93% to 99.5 mass % with respect to a total content of the radically polymerizable compound C1 and the radically polymerizable compound C2. 13. The photosensitive composition according to claim 1 , which is a photosensitive composition for pulse exposure to light having a wavelength of 300 nm or shorter. 14. The photosensitive composition according to claim 1 , which is a photosensitive composition for pulse exposure under a condition of a maximum instantaneous illuminance of 50000000 W/m 2 or higher. 15. The photosensitive composition according to claim 1 , which is a photosensitive composition for a solid-state imaging element. 16. The photosensitive composition according to claim 1 , which is a photosensitive composition for a color filter.

Assignees

Inventors

Classifications

  • Highly-doped buried regions of integrated devices · CPC title

  • G03F7/031Primary

    Organic compounds not covered by group G03F7/029 · CPC title

  • Optical brightening agents, organic pigments · CPC title

  • condensed with carbocyclic rings · CPC title

  • of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen · CPC title

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What does patent US11953831B2 cover?
Provided are a photosensitive composition for pulse exposure including: a coloring material A; a photoradical polymerization initiator B; and a radically polymerizable compound C, in which a content of a radically polymerizable compound C1 having a weight-average molecular weight of 3000 or higher is 70 mass % or higher with respect to a total mass of the radically polymerizable compound C.
Who is the assignee on this patent?
Fujifilm Corp
What technology area does this patent fall under?
Primary CPC classification G03F7/031. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 09 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).