Photoresist material, method of fabcricating same, and color filter substrate

Patent metadata

Field	Value
Publication number	US-11506975-B2
Application number	US-202016652036-A
Country	US
Kind code	B2
Filing date	Jan 10, 2020
Priority date	Dec 26, 2019
Publication date	Nov 22, 2022
Grant date	Nov 22, 2022

Abstract

A photoresist material, a method of fabricating the same, and a color filter substrate are described. The photoresist material has an oligomer segment having a chemical structural formula of:

wherein a value of n is 1 to 2.

First claim

The invention claimed is:

1. A photoresist material, comprising an oligomer segment having a chemical structural formula of:

wherein a value of n is 1 to 2;
wherein, R comprises: at least one of non-conjugated linear alkanes, branched alkanes, alkoxy alkane, halogen-substituted alkane derivatives, conjugate structures linked through alkoxy and ester groups, or compounds containing heterocycles.

2. A method of fabricating a photoresist material, comprising:
dissolving and stirring compound 1 in tetrahydrofuran to form a first solution, adding sodium hydride to the first solution to form a second solution, and adding compound 2 to the second solution to stir at 60° C. for 6 hours so as to obtain compound 3 after purifying and isolating;
wherein a chemical structure of the compound 1 is:

wherein a chemical structure of the compound 2 is:

and wherein a chemical structure of the compound 3 is:

3. The method of fabricating the photoresist material according to claim 2 , wherein a molar ratio of the compound 1 to the sodium hydride is 4:1; and
a molar ratio of the compound 1 to the compound 2 is 4:1.5.

4. The method of fabricating the photoresist material according claim 2 , further comprising:
dissolving the compound 3 and an oligomer segment in toluene to form a first solution, and adding a catalyst to the first solution to obtain the photoresist material through a purification treatment after a reaction at room temperature for 30 minutes,
wherein the oligomer segment having a chemical structural formula of:

wherein a value of n is 1 or 2;
wherein, R comprises: at least one of non-conjugated linear alkanes, branched alkanes, alkoxy alkane, halogen-substituted alkane derivatives, conjugate structures linked through alkoxy and ester groups, or compounds containing heterocycles,
wherein a chemical structure of the photoresist material is:

5. The method of fabricating the photoresist material according to claim 4 , wherein:
a molar ratio of the compound 3 to the oligomer segment is 1:1.

6. The method of fabricating the photoresist material according to claim 4 , wherein R in the oligomer segment comprises:
at least one of non-conjugated linear alkanes, branched alkanes, alkoxy alkane, halogen-substituted alkane derivatives, conjugate structures linked through alkoxy and ester groups, or compounds containing heterocycles; wherein the heterocyclic compound includes at least one of a five-membered heterocyclic ring compound, a six-membered heterocyclic ring compound, or a benzoheterocyclic compound;
wherein the five-membered heterocyclic compound comprises at least one of furan, thiophene, pyrrole, thiazole, and imidazole; and
wherein the six-membered heterocyclic compound comprises at least one of pyridine, pyrazine, pyrimidine, and pyridazine.

7. The method of fabricating the photoresist material according to claim 6 , wherein carbon chain length in R is 1 to 3.

8. The method of fabricating the photoresist material according to claim 4 , wherein the catalyst is pentamethylcyclopentadienyl ruthenium chloride.

9. A color filter substrate, comprising a color resist layer, wherein material of the color resist layer comprises the photoresist material according to claim 1 .

Assignees

• Tcl China Star Optoelectronics Tech Co Ltd

Inventors

• Ai Lin

Classifications

• G02B5/223

  containing organic substances, e.g. dyes, inks or pigments · CPC title

• G03F7/0007

  Filters, e.g. additive colour filters; Components for display devices · CPC title

• G02B1/04

  made of organic materials, e.g. plastics (G02B1/08 takes precedence) · CPC title

• G03F7/0085

  characterised by the non-macromolecular additives · CPC title

• G03F7/012 Primary

  Macromolecular azides; Macromolecular additives, e.g. binders {(G03F7/0085 takes precedence)} · CPC title