Area selective carbon-based film deposition
US-2024234127-A1 · Jul 11, 2024 · US
by etching with a plasma
by etching with a plasma · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/0245 |
| Official title | {by etching with a plasma} |
| Display label | by etching with a plasma |
| Total patents | 504 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 23 |
| 2016 | 19 |
| 2017 | 33 |
| 2018 | 39 |
| 2019 | 66 |
| 2020 | 45 |
| 2021 | 47 |
| 2022 | 54 |
| 2023 | 51 |
| 2024 | 55 |
| 2025 | 64 |
| 2026 | 8 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Pre-clean of silicon germanium for pre-metal contact at source and drain and pre-high k at channel
US-2017365468-A1 · Dec 21, 2017 · US
Selective cobalt deposition on copper surfaces
US-2017321320-A1 · Nov 9, 2017 · US
Hydrophobic and oleophobic coatings
US-9809712-B2 · Nov 7, 2017 · US
Preparing a semiconductor surface for epitaxial deposition
US-9793104-B2 · Oct 17, 2017 · US
Conductive adhesive with spherical graphene and manufacturing method thereof
US-2017283665-A1 · Oct 5, 2017 · US
Process chamber for etching low k and other dielectric films
US-2017229325-A1 · Aug 10, 2017 · US
Conductive adhesive with spherical graphene and manufacturing method thereof
US-9725625-B2 · Aug 8, 2017 · US
Method for manufacturing multilayer wiring board
US-2017223842-A1 · Aug 3, 2017 · US
Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in PECVD system
US-9711360-B2 · Jul 18, 2017 · US
Method for separating nanoparticles and analyzing biological substance using microfluidic chip
US-9696301-B2 · Jul 4, 2017 · US
Coating method for gas delivery system
US-9689533-B2 · Jun 27, 2017 · US
Technique to deposit metal-containing sidewall passivation for high aspect ratio cylinder etch
US-2017170026-A1 · Jun 15, 2017 · US
Separator for secondary cell having excellent heat resistance and shutdown properties
US-2017162855-A1 · Jun 8, 2017 · US
Method of making a nanostructure and nanostructured articles
US-2017067150-A1 · Mar 9, 2017 · US
Method of processing workpiece
US-2017069473-A1 · Mar 9, 2017 · US
Methods to improve in-film particle performance of amorphous boron-carbon hardmask process in pecvd system
US-2017062218-A1 · Mar 2, 2017 · US
Gas barrier film and method for producing it
US-2017009034-A1 · Jan 12, 2017 · US
Method and apparatus to abate pyrophoric byproducts from ion implant process
US-2016376710-A1 · Dec 29, 2016 · US
Internal-combustion engine cylinder block and production method therefor
US-2016369737-A1 · Dec 22, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/0245?
- CPC C23C16/0245 is the Cooperative Patent Classification code for “by etching with a plasma.”
- How many patents are filed under CPC C23C16/0245 (by etching with a plasma)?
- Our database includes 504 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/0245 growing?
- Publication counts under this code: 55 in 2024 vs 64 in 2025 (latest complete years).