Multifocal magnetron design for physical vapor deposition processing on a single cathode
US-12283470-B2 · Apr 22, 2025 · US
using electrons, e.g. triode sputtering · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C14/355 |
| Official title | {using electrons, e.g. triode sputtering} |
| Display label | using electrons, e.g. triode sputtering |
| Total patents | 17 |
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2016 | 2 |
| 2017 | 3 |
| 2018 | 1 |
| 2019 | 3 |
| 2020 | 2 |
| 2021 | 1 |
| 2022 | 2 |
| 2023 | 1 |
| 2024 | 1 |
| 2025 | 1 |
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
US-12283470-B2 · Apr 22, 2025 · US
US-2024093351-A1 · Mar 21, 2024 · US
US-11652218-B2 · May 16, 2023 · US
US-11396695-B2 · Jul 26, 2022 · US
US-2022123326-A1 · Apr 21, 2022 · US
US-2021071295-A1 · Mar 11, 2021 · US
US-10844477-B2 · Nov 24, 2020 · US
US-2020165716-A1 · May 28, 2020 · US
US-10378102-B2 · Aug 13, 2019 · US
US-10316970-B2 · Jun 11, 2019 · US
US-2019136369-A1 · May 9, 2019 · US
US-2018030591-A1 · Feb 1, 2018 · US
US-2017167012-A1 · Jun 15, 2017 · US
US-2017074400-A1 · Mar 16, 2017 · US
US-9540726-B2 · Jan 10, 2017 · US
US-2016369391-A1 · Dec 22, 2016 · US
US-9523146-B1 · Dec 20, 2016 · US