Drill having a coating

Patent metadata

Field	Value
Publication number	US-9540726-B2
Application number	US-201214352872-A
Country	US
Kind code	B2
Filing date	Oct 18, 2012
Priority date	Oct 21, 2011
Publication date	Jan 10, 2017
Grant date	Jan 10, 2017

Abstract

The present invention relates to a method for coating a substrate, preferably a drill, wherein at least one first HiPIMS layer is applied by means of a HiPIMS process. Preferably, at least one second layer is applied to the first HiPIMS layer by means of a coating process that does not contain a HiPIMS process.

First claim

What is claimed is:

1. Drill with a coating that is executed at least on the drill head of the drill and that has at least one HiPIMS layer that is applied directly onto the drill body of the drill, characterized in that the HiPIMS layer includes at least one layer of at least one nitride and/or carbide and/or oxide, and an amorphous carbon or DLC layer provided on the HiPIMS layer,
wherein the amorphous carbon or the DLC layer, in the form of a metalliferous DLC layer, is provided on the HiPIMS layer, and
the metal content in the DLC layer decreases gradually towards the surface.

2. Drill according to claim 1 , characterized in that the HiPIMS layer includes at least one metal from the group consisting of chromium, titanium, aluminum and tungsten.

3. Drill according to claim 2 , characterized in that the HiPIMS layer is a (Al,Cr)N layer.

4. Drill according to claim 2 , wherein the HiPIMS layer includes two of the metals from the group consisting of chromium, titanium, aluminum and tungsten.

5. Drill according to claim 1 , characterized in that the total thickness of the coating is between 0.1 μm and 10 μm.

6. Drill according to claim 1 , characterized in that the drill is a micro drill and the total thickness of the coating is preferably between 0.01 μm and 5 μm.

7. Drill according to claim 1 , wherein the drill comprises a tap drill.

8. Coating method for coating substrates, wherein at least one first and at least one second layer are deposited on at least one part of the substrate surface, characterized in that:
the first layer is a HiPIMS layer that is applied by means of a HiPIMS process, preferably directly onto the substrate surface, and
the second layer is applied by means of a coating method of another type, by means of at least one of conventional sputtering and a PACVD method and a combined MS/PACVD method onto the first layer,
wherein the first layer includes at least one layer of at least one nitride and/or carbide and/or oxide, and an amorphous carbon or DLC layer provided on the HiPIMS layer.

9. Method according to claim 8 , characterized in that the HiPIMS layer is deposited with at least one of one nitride and carbide and oxide, and the second layer is deposited with carbon.

10. Method according to claim 9 , characterized in that the metalliferous DLC layer is deposited in such a way that the metal content in the DLC layer decreases gradually towards the surface and preferably a non-metalliferous DLC run-in layer is deposited as top layer onto the metalliferous DLC layer.

11. Method according to claim 9 , characterized in that
the HiPIMS layer is deposited as a functional layer, preferably from (Al,Cr)N or with (Al,Cr)N, and
the second layer is deposited as sliding layer, preferably deposited by using a MS method or a combined MS/PACVD method, preferably from DLC containing chromium, and
between the HiPIMS layer and the second layer at least one interlayer is deposited, preferably from CrN and/or CrCN, and
preferably a non-metalliferous DLC run-in layer is applied as top layer onto the metalliferous DLC layer.

12. Method according to claim 11 , wherein the HiPIMS layer is deposited with an aluminum concentration relative to the chromium in a ratio of approx. 70 Al to 30 Cr in atomic percent.

13. Method according to claim 11 , wherein, between the HiPIMS layer and the second layer, at least two interlayers are deposited.

14. Substrate with a coating applied according to a method according to claim 9 on at least one part of the substrate surface.

15. Substrate according to claim 14 , wherein the substrate comprises drill.

16. Substrate according to claim 14 , wherein the substrate comprises tool or component.

17. Method according to claim 9 , wherein the second layer is deposited as DLC or metalliferous DLC.

18. Method according to claim 8 , characterized in that the HiPIMS layer is deposited with at least one metal from the group consisting of chromium, titanium, aluminum and tungsten.

19. Method according to claim 18 , wherein the HiPIMS layer is deposited with two of the metals from the group consisting of chromium, titanium, aluminum and tungsten.

20. Method according to claim 18 , wherein the HiPIMS layer is a layer containing (Al,Cr)N.

21. Method according to claim 9 , characterized in that the metal that is used for depositing the metalliferous DLC layer matches a metal in the HiPIMS layer.

22. Drill with a coating that is executed at least on the drill head of the drill and that has at least one HiPIMS layer that is applied directly onto the drill body of the drill, characterized in that the HiPIMS layer includes at least one layer of at least one nitride and/or carbide and/or oxide, and an amorphous carbon or DLC layer provided on the HiPIMS layer,
wherein a metalliferous DLC layer, is provided on the HiPIMS layer,
at least one metallic element in the metalliferous DLC layer matches a metallic element in the HiPIMS layer, and
between the HiPIMS layer and the metalliferous DLC layer, at least one layer containing nitrogen and carbon is deposited, whose nitrogen content decreases gradually towards the surface.

23. Drill according to claim 22 , wherein the total thickness of the coating is between 0.1 μm and 10 μm.

24. Drill according to claim 22 , wherein the drill is a micro drill and the total thickness of the coating is preferably between 0.01 μm and 5 μm.

25. Drill according to claim 22 , wherein the HiPIMS layer includes at least one metal from the group consisting of chromium, titanium, aluminum and tungsten.

26. Drill according to claim 25 , wherein the HiPIMS layer is a (Al,Cr)N layer.

Assignees

• Oerlikon Trading Ag
• Oerlikon Surface Solutions Ag Pfaffikon

Inventors

• Krassnitzer Siegfried

Classifications

• Y10T408/89

  Tool or Tool with support · CPC title

• C23C14/35 Primary

  by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)} · CPC title

• C23C16/277

  using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets · CPC title

• B23B51/00 Primary

  Tools for drilling machines · CPC title

• B23G2200/26

  Coatings of tools · CPC title