Ti—Si—C—N piston ring coatings

Patent metadata

Field	Value
Publication number	US-9523146-B1
Application number	US-201514742561-A
Country	US
Kind code	B1
Filing date	Jun 17, 2015
Priority date	Jun 17, 2015
Publication date	Dec 20, 2016
Grant date	Dec 20, 2016

Abstract

A Ti—Si—C—N coating for a piston ring and a method forming such coating, wherein the deposited coating exhibits a thickness in the range of 10.0 micrometers to 20.0 micrometers and exhibits a coefficient of friction of less than 0.15 and a wear rate of less than 10×10 −6 mm 3 /N/m. The coefficient of friction being measured on a Plint TE77 and the wear rate being measured against an alumina ball of 0.25 inches in diameter at a load of 1 N at 100 rpm in a dry environment. The deposited Ti—Si—C—N coating includes nanocrystalline phases in an amorphous matrix.

First claim

What is claimed is:

1. A method of coating piston rings, comprising:
placing a piston ring into a process chamber;
reducing gas pressure in said process chamber;
supplying an inert gas to said process chamber and generating a plasma of said inert gas;
supplying nitrogen to said process chamber at a flow rate of 40 sccm to 60 sccm;
supplying hexamethyldisilazane to said process chamber at a rate of 3 grams per hour to 9 grams per hour;
sputtering titanium from a magnetron target in said process chamber; and
depositing a Ti—Si—C—N coating on said piston ring, wherein said coating has a thickness in the range of 10.0 micrometers to 40.0 micrometers and exhibits a coefficient of friction of less than 0.15, a wear rate of less than 10×10 −6 mm 3 /N/m, and a nanohardness in the range of 10.0 GPa to 30.0 GPa, wherein said coefficient of friction is measured using a Plint TE77 testing apparatus using 10W-30 oil maintained at 35° C. as a lubricant, under a force of 30 N, and a sliding frequency of 5 to 20 Hz, and said wear rate is measured against an alumina ball of 0.25 inches in diameter at a load of 1 N at 100 rpm in a dry environment,
wherein said Ti—Si—C—N coating includes nanocrystalline phases having a grain size in the range of 3 nm to 10 nm in an amorphous matrix, wherein said nanocrystalline phases include TiC x N y , wherein x is in the range of 0.00 to 1.00 and y is in the range of 1.00 to 0.00.

2. The method of claim 1 , wherein said nitrogen is supplied to said process chamber as nitrogen gas, ammonia, or combinations thereof.

3. The method of claim 1 , further comprising supplying carbon to said process chamber, wherein said carbon is supplied as acetylene, methane, or combinations thereof.

4. The method of claim 1 , further comprising negatively biasing an electron source in the range of 50 V to 120 V to form said plasma and said process chamber is biased in the range of 50 V to 150 V relative to said electron source.

5. The method of claim 1 , wherein said piston ring is negatively biased in the range of 20 V to 200 V and said magnetron is negatively biased in the range of 0.05 to 10 kW.

6. The method of claim 1 , wherein said deposited coating comprises titanium present in the range of 35 to 49 atomic percent, silicon present in the range of 1 to 5 atomic percent, carbon present in the range of 17 to 41 atomic percent, and nitrogen present in the range of 19 to 35 atomic percent.

7. The method of claim 1 , wherein said deposited coating comprises titanium present in the range of 43.5 to 46.7 atomic percent, silicon present in the range of 1.58 to 3.04 atomic percent, carbon present in the range of 17.6 to 22.5 atomic percent, and nitrogen present in the range of 30.9 to 34.2 atomic percent.

8. The method of claim 7 , wherein the coefficient of friction is in the range of 0.21 to 0.26, and the wear rate is in the range of 3.02 to 7.35×10 −6 mm 3 /N/M.

9. The method of claim 1 , further comprising supplying acetylene to said process chamber at a flow rate in the range of 10 sccm to 30 sccm and said deposited coating comprises titanium present in the range of 38 to 48.4 atomic percent, silicon present in the range of 1.84 to 2.34 atomic percent, carbon present in the range of 21.5 to 38.1 atomic percent, and nitrogen present in the range of 21.59 to 28.09 atomic percent.

10. The method of claim 9 , wherein the coefficient of friction is in the range of 0.21 to 0.33, the wear rate may be in the range of 4.59×10 −6 mm 3 /N/m to 5.02×10 −6 mm 3 /N/m, and the nanohardness may be in the range of 14.5 GPa to 16.7 GPa.

11. The method of claim 1 , further comprising supplying acetylene to said process chamber at a flow rate in the range of 15 sccm to 25 sccm and said deposited coating comprises titanium present in the range of 35.6 to 43.3 atomic percent, silicon present in the range of 2.33 to 4.12 atomic percent, carbon present in the range of 29.0 to 40.8 atomic percent, and nitrogen present in the range of 19.64 to 25.34 atomic percent.

12. The method of claim 11 , wherein the coefficient of friction is in the range of 0.16 to 0.21, the wear rate is in the range of 3.84×10 −6 mm 3 /N/m to 5.78×10 −6 mm 3 /N/m, the nanohardness is in the range of 13.8 GPa to 14.5 GPa.

13. The method of claim 1 , further comprising supplying acetylene to said process chamber wherein said deposited coating comprises titanium present in the range of 41 to 43.3 atomic percent, silicon present in the range of 2.3 to 3.8 atomic percent, carbon present in the range of 29 to 33 atomic percent, and nitrogen present in the range of 22 to 25 atomic percent.

14. The method of claim 13 , wherein the coefficient of friction may be in the range of 0.21 to 0.22 and the wear rate is in the range of 4.69×10 −6 mm 3 /N/m to 5.78×10 −6 mm 3 /N/m.

15. The method of claim 1 , wherein said amorphous matrix includes one of the following compositions: diamond like carbon, Si—N, and Si—N—C.

Assignees

• Southwest Res Inst

Inventors

• Lin Jianliang
• Wei Ronghua
• Lee Peter Mark
• Bitsis Jr Daniel Christopher

Classifications

• F16J9/26 Primary

  characterised by the use of particular materials · CPC title

• C23C14/345

  using substrate bias · CPC title

• C23C14/355

  using electrons, e.g. triode sputtering · CPC title

• C23C14/0057

  using reactive gases other than O2, H2O, N2, NH3 or CH4 · CPC title

• C23C14/0664 Primary

  Carbonitrides · CPC title