Rotary cathode unit for magnetron sputtering apparatus

Patent metadata

Field	Value
Publication number	US-10378102-B2
Application number	US-201615552079-A
Country	US
Kind code	B2
Filing date	Jan 8, 2016
Priority date	Feb 24, 2015
Publication date	Aug 13, 2019
Grant date	Aug 13, 2019

Abstract

A magnet unit Mu is disposed inside a target of a cylindrical shape and generates a magnetic field that leaks from a surface of the target such that a line passing through a position in which a vertical component of the magnetic field becomes zero extends along a generating line of the target so as to close like a racetrack shape. The magnet unit is constituted into separate parts of: a first part which respectively forms a corner portion of the racetrack shape at both ends, in the direction of the generating line, of the target; a second part which is respectively disposed on the inside, as seen in the direction of the generating line, of the target, adjacent to the first part; and a third part which is positioned between the second parts.

First claim

What is claimed is:

1. A rotary cathode unit for a magnetron sputtering apparatus comprising:
a cylindrical target;
a magnet unit disposed in an inner space of the target, the magnet unit generating a magnetic field that leaks from a target surface such that a line passing through a position in which a vertical component of the magnetic field becomes zero extends along a generating line of the target so as to close like a racetrack shape;
coolant circulation means for circulating a coolant through the inner space of the target;
and driving means for driving the target to rotate,
wherein the magnet unit includes
a pair of first magnets, a pair of second magnets, and a single third magnet which are arranged in a direction of the generating line,
the pair of first magnets which respectively forms a corner portion of the racetrack shape and each first part being located respectively at both ends, as seen in the direction of the generating line, of the target;
the pair of second magnets which is respectively disposed on the inside, as seen in the direction of the generating line, of the target, immediately adjacent to the pair of first parts; and
the single third magnet which is positioned centrally and immediately adjacent to (and between) each second magnet; and,

wherein each of the pair of first magnets, each of the pair of second magnets, and the single third magnet
has a yoke underneath respectively, each yoke having a same sectional shape, and
is divided in a direction perpendicular to the direction of the generating line into central magnets on a top surface of each yoke; and
peripheral magnets which are substantially equal in length to the central magnets provided in parallel to the central magnets

wherein the magnet unit includes a first moving means for moving the pair of the first magnet and the pair of the second magnet independent of each other toward and away from the surface of the target, the first moving means being housed in the inner space of the target.

2. The rotary cathode unit for a magnetron sputtering apparatus according to claim 1 , further comprising still second moving means for moving the single third magnet of the magnet unit independently toward and away from the surface of the target.

3. The rotary cathode nit for a magnetron sputtering apparatus according to claim 1 , further comprising a magnet case disposed by insertion into the inner space of the target,
wherein the magnet unit is placed in position inside the magnet case that is kept atmospheric.

4. The rotary cathode unit for a magnetron sputtering apparatus according to claim 3 ,
wherein the first moving means is housed inside the magnet case, the first moving means being for moving the pair of the first magnets, the pair of the second magnets, and the single third magnet respectively independent of one another toward and away from the surface of the target.

5. The rotary cathode unit for a magnetron sputtering apparatus according to claim 3 , the target further comprising: a backing tube; and a target material bonded to an outside surface of the backing tube,
wherein a fluid flow passage of the coolant circulation means is formed between an outer surface of the magnet case and an inner peripheral surface of the backing tube.

6. The rotary cathode unit for a magnetron sputtering apparatus according to claim 3 , the first moving means comprising: a motor; and a crank mechanism coupled to a driving shaft of the motor,
wherein the first moving means is coupled to the magnet unit through a crank arm of the crank mechanism so that, by driving the motor to rotate, the magnet unit is movable toward and away from the target.

7. The rotary cathode unit for a magnetron sputtering apparatus according to claim 1 , wherein the single third magnet of the magnet unit has a different length in the direction of generating line from either the pair of first magnets and the pair of second magnets.

Assignees

• Ulvac Inc

Inventors

• Saitou Shuuji

Classifications

• H01J37/342

  Hollow targets · CPC title

• H01J37/3455

  Movable magnets · CPC title

• H01J37/3405

  Magnetron sputtering · CPC title

• C23C14/35 Primary

  by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)} · CPC title

• C23C14/3407 Primary

  Cathode assembly for sputtering apparatus, e.g. Target · CPC title