Optical filter including a high refractive index material
US-12595549-B2 · Apr 7, 2026 · US
using other particles than noble gas ions (C23C14/0036, C23C14/46 take precedence)
using other particles than noble gas ions (C23C14/0036, C23C14/46 take precedence) · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C14/3457 |
| Official title | {using other particles than noble gas ions (C23C14/0036, C23C14/46 take precedence)} |
| Display label | using other particles than noble gas ions (C23C14/0036, C23C14/46 take precedence) |
| Total patents | 57 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 6 |
| 2016 | 8 |
| 2017 | 12 |
| 2018 | 6 |
| 2019 | 5 |
| 2020 | 7 |
| 2021 | 3 |
| 2022 | 3 |
| 2023 | 1 |
| 2024 | 2 |
| 2025 | 3 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Near infrared optical interference filters with improved transmission
US-2025389880-A1 · Dec 25, 2025 · US
Near infrared optical interference filters with improved transmission
US-12422605-B2 · Sep 23, 2025 · US
Film formation apparatus
US-2025146125-A1 · May 8, 2025 · US
Method for Improving Deposition Process
US-2024387155-A1 · Nov 21, 2024 · US
Method for improving deposition process
US-12112930-B2 · Oct 8, 2024 · US
Thin film formation apparatus and method using plasma
US-11646203-B2 · May 9, 2023 · US
Near infrared optical interference filters with improved transmission
US-2022299688-A1 · Sep 22, 2022 · US
Near infrared optical interference filters with improved transmission
US-11372144-B2 · Jun 28, 2022 · US
Sputtering apparatus, sputtering target, and method for forming semiconductor film with the sputtering apparatus
US-11309181-B2 · Apr 19, 2022 · US
Coated metallic substrate and fabrication method
US-11193210-B2 · Dec 7, 2021 · US
Sputtering equipment and method of manufacturing semiconductor device
US-11193218-B2 · Dec 7, 2021 · US
Thin film formation apparatus and method using plasma
US-2021210342-A1 · Jul 8, 2021 · US
Gas barrier film
US-10844186-B2 · Nov 24, 2020 · US
Sputtering equipment and method of manufacturing semiconductor device
US-2020308725-A1 · Oct 1, 2020 · US
Optical film structures, inorganic oxide articles with optical film structures, and methods of making the same
US-2020158916-A1 · May 21, 2020 · US
A coated metallic substrate and fabrication method
US-2020141008-A1 · May 7, 2020 · US
Optical filter including a high refractive index material
US-2020096675-A1 · Mar 26, 2020 · US
Method for Improving Deposition Process
US-2020075299-A1 · Mar 5, 2020 · US
Plasma spray systems and methods
US-2020040444-A1 · Feb 6, 2020 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C14/3457?
- CPC C23C14/3457 is the Cooperative Patent Classification code for “using other particles than noble gas ions (C23C14/0036, C23C14/46 take precedence).”
- How many patents are filed under CPC C23C14/3457 (using other particles than noble gas ions (C23C14/0036, C23C14/46 take precedence))?
- Our database includes 57 publications tagged with this CPC code.
- Is patent activity under CPC C23C14/3457 growing?
- Publication counts under this code: 2 in 2024 vs 3 in 2025 (latest complete years).