Gas barrier film
US-9219018-B2 · Dec 22, 2015 · US
US10844186B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10844186-B2 |
| Application number | US-201715403799-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 11, 2017 |
| Priority date | Oct 28, 2011 |
| Publication date | Nov 24, 2020 |
| Grant date | Nov 24, 2020 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A gas barrier film including a polymer base, an undercoat layer that contains, as the main component, an acrylic resin having at least one side chain selected from the group consisting of the side chains (I) to (III) mentioned below, and an inorganic layer, wherein the undercoat layer and the inorganic layer are arranged in this order on at least one surface of the polymer base in such a manner that the undercoat layer and the inorganic layer are in contact with each other: (I) a side chain having an acrylic polymer skeleton; (II) a side chain having a dimethylsiloxane skeleton; and (III) a side chain having a skeleton containing a fluorine atom.
Opening claim text (preview).
What is claimed: 1. A gas barrier film comprising a polymer base laminated, at least on one surface thereof, with an inorganic layer, wherein the inorganic layer comprises a layer [B1] as specified below: Layer [B1]: a layer of a phase in which zinc oxide, silicon dioxide, and aluminum oxide coexist, wherein the inorganic layer is a layer [B1] as specified above and the layer [B1] has a zinc (Zn) atom concentration of 20 to 40 atom %, a silicon (Si) atom concentration of 13.1 to 20 atom %, an aluminum (Al) atom concentration of 0.5 to 5 atom %, and an oxygen (O) atom concentration of 35 to 70 atom % as determined by ICP emission spectroscopy analysis. 2. Gas barrier film as described in claim 1 , wherein the inorganic layer has a thickness of 10 to 1,000 nm. 3. Gas barrier film as described in claim 1 , wherein the inorganic layer has a surface roughness Ra of 2 nm or less. 4. Gas barrier film as described in claim 1 , further comprising an undercoat layer, wherein the undercoat layer and the inorganic layer are stacked in contact with each other in this order on the polymer base. 5. Gas barrier film as described in claim 4 , wherein the undercoat layer contains an acrylic resin as the primary component. 6. Gas barrier film as described in claim 4 , wherein the undercoat layer has a surface free energy of 10 to 45 mN/m. 7. Gas barrier film as described in claim 4 , wherein the undercoat layer has a thickness of 0.2 to 10 μm.
on to polymers containing fluorine · CPC title
Polysiloxanes · CPC title
Polymerisation of acrylate or methacrylate esters on to polymers thereof · CPC title
Forming gas barrier coatings · CPC title
Forming abrasion-resistant coatings; Forming surface-hardening coatings · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.