Phenolic epoxy system
US-2020399461-A1 · Dec 24, 2020 · US
with polyhydric phenols
with polyhydric phenols · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C09D161/12 |
| Official title | with polyhydric phenols |
| Display label | with polyhydric phenols |
| Total patents | 83 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 5 |
| 2016 | 12 |
| 2017 | 10 |
| 2018 | 12 |
| 2019 | 15 |
| 2020 | 7 |
| 2021 | 12 |
| 2022 | 2 |
| 2023 | 4 |
| 2024 | 3 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin
US-2020361843-A1 · Nov 19, 2020 · US
Coating compositions including a resole phenolic resin, articles, and methods of coating
US-2020224053-A1 · Jul 16, 2020 · US
Hardmask composition, hardmask layer and method of forming patterns
US-2020209754-A1 · Jul 2, 2020 · US
Composition for forming resist underlayer film, resist underlayer film, method for forming resist pattern and method for producing semiconductor device
US-2020142310-A1 · May 7, 2020 · US
Adhesion composition and textile materials and articles treated therewith
US-2020010744-A1 · Jan 9, 2020 · US
Resist underlayer film-forming composition, resist underlayer film, resist underlayer film-forming process, and production method of patterned substrate
US-10520814-B2 · Dec 31, 2019 · US
Resist multilayer film-attached substrate and patterning process
US-10514605-B2 · Dec 24, 2019 · US
Adhesion composition and textile materials and articles treated therewith
US-10465102-B2 · Nov 5, 2019 · US
Varnish, prepreg, film with resin, metal foil-clad laminate, and printed circuit board
US-10465089-B2 · Nov 5, 2019 · US
Semiconductor substrate treatment agent and substrate-treating method
US-2019264035-A1 · Aug 29, 2019 · US
Laminate and making method
US-10373903-B2 · Aug 6, 2019 · US
Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate
US-2019212650-A1 · Jul 11, 2019 · US
Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin
US-10294183-B2 · May 21, 2019 · US
Phenolic hydroxyl-containing compound, composition containing the same, and cured film of the composition
US-10266471-B2 · Apr 23, 2019 · US
Composition for film formation, film, resist underlayer film-forming method, production method of patterned substrate, and compound
US-2019094695-A1 · Mar 28, 2019 · US
Resist multilayer film-attached substrate and patterning process
US-2019041753-A1 · Feb 7, 2019 · US
Composition for forming organic film
US-2019041752-A1 · Feb 7, 2019 · US
Curable composition for permanent resist films, and permanent resist film
US-10179828-B2 · Jan 15, 2019 · US
Liquid phenolic resol resin, method for preparing liquid phenolic resol resin, and article
US-2019010416-A1 · Jan 10, 2019 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C09D161/12?
- CPC C09D161/12 is the Cooperative Patent Classification code for “with polyhydric phenols.”
- How many patents are filed under CPC C09D161/12 (with polyhydric phenols)?
- Our database includes 83 publications tagged with this CPC code.
- Is patent activity under CPC C09D161/12 growing?
- Publication counts under this code: 4 in 2023 vs 3 in 2024 (latest complete years).