Resist underlayer film composition, patterning process, and compound
US-10156788-B2 · Dec 18, 2018 · US
with polyhydric phenols
with polyhydric phenols · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08G8/20 |
| Official title | with polyhydric phenols |
| Display label | with polyhydric phenols |
| Total patents | 146 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 10 |
| 2016 | 18 |
| 2017 | 11 |
| 2018 | 21 |
| 2019 | 21 |
| 2020 | 13 |
| 2021 | 16 |
| 2022 | 10 |
| 2023 | 10 |
| 2024 | 9 |
| 2025 | 7 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Novolac resin and resist film
US-2018334523-A1 · Nov 22, 2018 · US
Resin containing phenolic hydroxyl groups, and resist film
US-2018327533-A1 · Nov 15, 2018 · US
Pattern-forming method, resin, and composition
US-10078265-B2 · Sep 18, 2018 · US
Method for producing a composition for forming an organic film
US-10047244-B2 · Aug 14, 2018 · US
Novolac phenol resin, manufacturing method therefor, photosensitive composition, resist material and coating film
US-10047186-B2 · Aug 14, 2018 · US
Method for producing purified lignin, purified lignin, resin composition and molded body
US-2018215878-A1 · Aug 2, 2018 · US
Use of low molecular weight lignin together with lignin for the production of a phenol-formaldehyde binder composition
US-10017636-B2 · Jul 10, 2018 · US
Phenolic resin composition
US-10000679-B2 · Jun 19, 2018 · US
Cellular porous monoliths containing condensed tannins
US-9994690-B2 · Jun 12, 2018 · US
Method for producing polymer for electronic material and polymer for electronic material obtained by the production method
US-2018134819-A1 · May 17, 2018 · US
Phenolic-hydroxyl-group-containing novolac resin and resist film
US-2018134834-A1 · May 17, 2018 · US
Compositions comprising lignin
US-9963555-B2 · May 8, 2018 · US
Resist base material, resist composition and method for forming resist pattern
US-2018107113-A1 · Apr 19, 2018 · US
Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method
US-2018095368-A1 · Apr 5, 2018 · US
Radiation-sensitive composition, amorphous film, and method for forming resist pattern
US-2018081270-A1 · Mar 22, 2018 · US
Radiation-sensitive composition
US-9897913-B2 · Feb 20, 2018 · US
Resist under layer film composition and patterning process
US-9899218-B2 · Feb 20, 2018 · US
Resist underlayer film-forming composition, resist underlayer film, resist underlayer film-forming process, and production method of patterned substrate
US-2018046081-A1 · Feb 15, 2018 · US
Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying compound or resin
US-2018044270-A1 · Feb 15, 2018 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C08G8/20?
- CPC C08G8/20 is the Cooperative Patent Classification code for “with polyhydric phenols.”
- How many patents are filed under CPC C08G8/20 (with polyhydric phenols)?
- Our database includes 146 publications tagged with this CPC code.
- Is patent activity under CPC C08G8/20 growing?
- Publication counts under this code: 9 in 2024 vs 7 in 2025 (latest complete years).