Method for producing a composition for forming an organic film

Patent metadata

Field	Value
Publication number	US-10047244-B2
Application number	US-201514804507-A
Country	US
Kind code	B2
Filing date	Jul 21, 2015
Priority date	Aug 22, 2014
Publication date	Aug 14, 2018
Grant date	Aug 14, 2018

Abstract

The present invention provides a method for producing a composition for forming an organic film, the composition being used in a process of manufacturing a semiconductor apparatus, the method including the steps of (1) washing a compound having an aromatic skeleton by an acid, (2) preparing a composition solution containing the washed compound, (3) filtering the prepared composition solution through a filter, and (4) putting the filtered composition solution into a container made of an organic resin. There can be provided a method for producing a composition for forming an organic film that can form an organic film in which defects after dry etching are reduced.

First claim

What is claimed is:

1. A method for producing a composition for forming an organic film, the composition being used in a process of manufacturing a semiconductor apparatus, the method comprising the steps of:
(1) washing a compound having an aromatic skeleton by an acid;
(2) preparing a composition solution containing the washed compound;
(3) filtering the prepared composition solution through a filter; and
(4) putting the filtered composition solution into a container made of an organic resin,
wherein the step of washing includes washing with an acid solution containing a halogen acid one or more times, and washing with an acid solution containing nitric acid one or more times, and
wherein the halogen acid is hydrofluoric acid or hydrochloric acid.

2. The method for producing a composition for forming an organic film according to claim 1 , wherein the aromatic skeleton is any of benzene, fluorene, carbazole, naphthalene, and anthracene.

3. The method for producing a composition for forming an organic film according to claim 2 , wherein the compound having the aromatic skeleton is obtained by polymerization of at least a phenol derivative or a naphthol derivative.

4. The method for producing a composition for forming an organic film according to claim 2 , wherein the step of washing includes washing with a mixed acid solution containing the halogen acid and nitric acid one or more times.

5. The method for producing a composition for forming an organic film according to claim 1 , wherein the compound having the aromatic skeleton is obtained by polymerization of at least a phenol derivative or a naphthol derivative.

6. The method for producing a composition for forming an organic film according to claim 5 , wherein the step of washing includes washing with a mixed acid solution containing the halogen acid and nitric acid one or more times.

7. The method for producing a composition for forming an organic film according to claim 1 , wherein the compound having the aromatic skeleton is obtained by polymerization of a phenol derivative or a naphthol derivative and an aldehyde derivative.

8. The method for producing a composition for forming an organic film according to claim 1 , wherein a content of silicon atoms in the washed compound is 100 ppb or less.

9. The method for producing a composition for forming an organic film according to claim 8 , wherein the step of washing includes washing with a mixed acid solution containing the halogen acid and nitric acid one or more times.

10. The method for producing a composition for forming an organic film according to claim 1 , wherein a content of iron atoms in the washed compound is 1 ppb or less.

11. The method for producing a composition for forming an organic film according to claim 10 , wherein the step of washing includes washing with a mixed acid solution containing the halogen acid and nitric acid one or more times.

12. The method for producing a composition for forming an organic film according to claim 1 , wherein the step of washing includes washing with a mixed acid solution containing the halogen acid and nitric acid one or more times.

13. The method for producing a composition for forming an organic film according to claim 1 , wherein a base material of the filter comprises one or more materials selected from nylon, polyethylene, polypropylene, polystyrene, and a fluorine resin.

Assignees

• Shinetsu Chemical Co

Inventors

• Kori Daisuke
• Ogihara Tsutomu
• Iwabuchi Motoaki

Classifications

• H10P76/20

  of masks comprising organic materials · CPC title

• H10P50/287

  by chemical means · CPC title

• H10P50/283

  by chemical means · CPC title

• C08G2261/3325

  derived from other polycyclic systems · CPC title

• G03F7/325

  Non-aqueous compositions · CPC title