Dental materials and method of manufacture
US-9724276-B2 · Aug 8, 2017 · US
Esters containing oxygen in addition to the carboxy oxygen
Esters containing oxygen in addition to the carboxy oxygen · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F222/20 |
| Official title | Esters containing oxygen in addition to the carboxy oxygen |
| Display label | Esters containing oxygen in addition to the carboxy oxygen |
| Total patents | 241 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 20 |
| 2016 | 33 |
| 2017 | 36 |
| 2018 | 22 |
| 2019 | 26 |
| 2020 | 33 |
| 2021 | 15 |
| 2022 | 16 |
| 2023 | 13 |
| 2024 | 18 |
| 2025 | 5 |
| 2026 | 4 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Photo-alignment copolymer, optical anistropic film and its preparation method
US-9720136-B2 · Aug 1, 2017 · US
Polymerizable liquid crystal composition and optically anisotropic body, retardation film, and patterned retardation film using the same
US-2017158793-A1 · Jun 8, 2017 · US
Polymers
US-2017073600-A1 · Mar 16, 2017 · US
Resin composition, resin film, and electronic device
US-9574090-B2 · Feb 21, 2017 · US
Radiation curable polymer formulation and methods for the preparation thereof
US-2017044289-A1 · Feb 16, 2017 · US
Resist composition and pattern forming process
US-2017031243-A1 · Feb 2, 2017 · US
Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound
US-2016376233-A1 · Dec 29, 2016 · US
Resist composition
US-2016377979-A1 · Dec 29, 2016 · US
Organic thin-film transistor and method for manufacturing same
US-2016372662-A1 · Dec 22, 2016 · US
Polymerizable composition containing reactive silsesquioxane compound
US-2016369029-A1 · Dec 22, 2016 · US
Polymer, chemically amplified positive resist composition and patterning process
US-2016370702-A1 · Dec 22, 2016 · US
Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device
US-2016355735-A1 · Dec 8, 2016 · US
Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device
US-2016348004-A1 · Dec 1, 2016 · US
Optical material composition and use thereof
US-2016312009-A1 · Oct 27, 2016 · US
Photoalignment materials having improved adhesion
US-9475901-B2 · Oct 25, 2016 · US
Optical fiber ribbons and ribbon matrix materials having low oligomer content
US-2016299305-A1 · Oct 13, 2016 · US
High refractive index addition-fragmentation agents
US-2016279033-A1 · Sep 29, 2016 · US
Cinnamic acid derivative, polymer thereof, and liquid crystal alignment layer comprising cured product thereof
US-2016274418-A1 · Sep 22, 2016 · US
Curable composition for imprints, cured product and method for manufacturing a cured product
US-9441065-B2 · Sep 13, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C08F222/20?
- CPC C08F222/20 is the Cooperative Patent Classification code for “Esters containing oxygen in addition to the carboxy oxygen.”
- How many patents are filed under CPC C08F222/20 (Esters containing oxygen in addition to the carboxy oxygen)?
- Our database includes 241 publications tagged with this CPC code.
- Is patent activity under CPC C08F222/20 growing?
- Publication counts under this code: 18 in 2024 vs 5 in 2025 (latest complete years).