Curable composition for imprints, cured product and method for manufacturing a cured product

Patent metadata

Field	Value
Publication number	US-9441065-B2
Application number	US-201414504583-A
Country	US
Kind code	B2
Filing date	Oct 2, 2014
Priority date	Dec 3, 2008
Publication date	Sep 13, 2016
Grant date	Sep 13, 2016

Abstract

Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

First claim

What is claimed is:

1. A curable composition for imprints comprising a polymerizable monomer (Ax), a photopolymerization initiator, and a surfactant, wherein the polymerizable monomer (Ax) is represented by the following formula (III):

wherein R 1 represents a hydrogen atom or a methyl group; X 1 is an unsubstituted alkylene group having 1 to 3 carbon atoms; Y 1 represents a substituent having a molecular weight of 15 or more and is selected from the group consisting an alkyl group, an alkoxy group, an aryloxy group, an aralkyl group, an acyl group, an alkoxycarbonyl group, an alkylthio group, and an arylthio group; n1 represents an integer of 0 to 3; and, when n1 is 0, X 1 is a hydrocarbon group having two or three carbon atoms; and, when the polymerizable monomer (Ax) is liquid at 25° C., the polymerizable monomer (Ax) has a viscosity of 500 mPa·s or less.

2. The curable composition for imprints according to claim 1 , wherein the polymerizable monomer (Ax) is a compound represented by the following formula (VI):

wherein R 1 represents a hydrogen atom or a methyl group; X 2 is an unsubstituted alkylene group having 1 to 3 carbon atoms; Y 2 represents a substituent having a molecular weight of 15 to 80, the substituent being other than an aromatic group-containing group; n2 represents an integer of 0 to 3; and, when n2 is 0, X 2 is a hydrocarbon group having two or three carbon atoms; and, when the polymerizable monomer (Ax) is liquid at 25° C., the polymerizable monomer (Ax) has a viscosity of 500 mPa·s or less.

3. The curable composition for imprints according to claim 2 , wherein Y 2 is an alkyl group having 1 to 6 carbon atoms, or an alkoxy group having 1 to 6 carbon atoms.

4. The curable composition for imprints according to claim 2 , wherein n2 represents an integer of 1 to 3.

5. The curable composition for imprints according to claim 2 , wherein n2=1.

6. A curable composition for imprints comprising a polymerizable monomer (Ax), a photopolymerization initiator, and a surfactant, wherein the polymerizable monomer (Ax) is a compound represented by the following formula (V):

wherein R 1 represents a hydrogen atom or a methyl group; X 3 is an unsubstituted alkylene group having 1 to 3 carbon atoms; Y 3 represents a substituent having an aromatic group and having a molecular weight of 15 or more; and n3 represents an integer of 1 to 3; and, when the polymerizable monomer (Ax) is liquid at 25° C., the polymerizable monomer (Ax) has a viscosity of 500 mPa·s or less.

7. The curable composition for imprints according to claim 6 , wherein Y 3 is a phenyl group, a benzyl group, a phenoxy group, a benzyloxy group, or a phenylthio group.

8. The curable composition for imprints according to claim 6 , wherein n3=1.

9. A curable composition for imprints comprising a polymerizable monomer (Ax) and a photopolymerization initiator, wherein the polymerizable monomer (Ax) is a compound represented by the following formula (VI):

wherein X 6 is a (n6+1)-valent linking group; each R 1 is a hydrogen atom or a methyl group; each of R 2 and R 3 is a substituent; each of n4 and n5 is an integer of 0 to 4; n6 is 1 or 2; and each of X 4 and X 5 is an unsubstituted alkylene group having 1 to 3 carbon atoms; and, when the polymerizable monomer (Ax) is liquid at 25° C., the polymerizable monomer (Ax) has a viscosity of 500 mPa·s or less.

10. The curable composition for imprints according to claim 9 , wherein n6=1.

11. The curable composition for imprints according to claim 9 , wherein n4 and n5=0.

12. The curable composition for imprints according to claim 9 , wherein X 6 is an alkylene group having 1 to 3 carbon atoms.

13. A method for manufacturing a cured product comprising;
applying the curable composition for imprints according to claim 1 onto a substrate to form a patterning layer thereon,
pressing a mold against the surface of the patterning layer, and
irradiating the patterning layer with light.

14. A curable composition for imprints comprising a polymerizable monomer (Ax), a photopolymerization initiator, and a surfactant,
wherein the polymerizable monomer (Ax) is represented by the following formula (III):

wherein R 1 represents a hydrogen atom or a methyl group; X 1 is an unsubstituted alkylene group having 1 to 3 carbon atoms; Y 1 represents a substituent having a molecular weight of 15 or more; n1 represents an integer of 0 to 3; and, when n1 is 0, X 1 is a hydrocarbon group having two or three carbon atoms; and, when the polymerizable monomer (Ax) is liquid at 25° C., the polymerizable monomer (Ax) has a viscosity of 500 mPa s or less; and
the content of the surfactant is 0.001 to 5% by mass of the composition.

15. The curable composition for imprints according to claim 14 , wherein the surfactant is a non-fluorine surfactant.

16. The curable composition for imprints according to claim 14 , wherein the surfactant is a nonionic surfactant.

17. The curable composition for imprints according to claim 6 , wherein the molecular weight of the substituent Y 3 is 230 to 350.

Assignees

• Fujifilm Corp

Inventors

• Kodama Kunihiko
• Sakita Kyouhei
• Yonezawa Hiroyuki

Classifications

• C08F2/48 Primary

  by ultraviolet or visible light · CPC title

• C08F222/24

  Esters containing sulfur · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• G03F7/004

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title