Polymer, Resist Composition, And Patterning Process
US-2024118617-A1 · Apr 11, 2024 · US
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Phenols or alcohols
Phenols or alcohols · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C08F112/24 |
| Official title | {Phenols or alcohols} |
| Display label | Phenols or alcohols |
| Total patents | 22 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2016 | 3 |
| 2017 | 4 |
| 2018 | 5 |
| 2020 | 4 |
| 2021 | 2 |
| 2023 | 3 |
| 2024 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Photosensitive resin composition
US-11739215-B2 · Aug 29, 2023 · US
Photoresist underlayer composition
US-2023103371-A1 · Apr 6, 2023 · US
Pattern formation method and method for manufacturing electronic device
US-2023067750-A1 · Mar 2, 2023 · US
Polymers and photoresist compositions
US-2021108065-A1 · Apr 15, 2021 · US
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing
US-10928727-B2 · Feb 23, 2021 · US
Resist underlayer compositions and methods of forming patterns with such compositions
US-2020348592-A1 · Nov 5, 2020 · US
Photoresist composition and a method for forming a fine pattern using the same
US-10691018-B2 · Jun 23, 2020 · US
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
US-10545405-B2 · Jan 28, 2020 · US
Photosensitive resin composition
US-2020012192-A1 · Jan 9, 2020 · US
Fluoro-alcohol additives for orientation control of block copolymers
US-10040879-B2 · Aug 7, 2018 · US
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, electronic device, and compound
US-10011576-B2 · Jul 3, 2018 · US
Photoresist composition and a method for forming a fine pattern using the same
US-2018164682-A1 · Jun 14, 2018 · US
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
US-2018120701-A1 · May 3, 2018 · US
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device
US-9904168-B2 · Feb 27, 2018 · US
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank including actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device
US-2017351176-A1 · Dec 7, 2017 · US
Superacid functional compounds
US-9708254-B2 · Jul 18, 2017 · US
Fluoro-alcohol additives for orientation control of block copolymers
US-2017066853-A1 · Mar 9, 2017 · US
Fluoro-alcohol additives for orientation control of block copolymers
US-9574107-B2 · Feb 21, 2017 · US
Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device
US-2016320700-A1 · Nov 3, 2016 · US