Iodine-containing metal compound and composition for depositing thin film including the same
US-12384805-B2 · Aug 12, 2025 · US
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Compounds without antimony-carbon linkages
Compounds without antimony-carbon linkages · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07F9/902 |
| Official title | {Compounds without antimony-carbon linkages} |
| Display label | Compounds without antimony-carbon linkages |
| Total patents | 22 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly growing.
| Year | Patents |
|---|---|
| 2015 | 5 |
| 2016 | 2 |
| 2017 | 2 |
| 2021 | 1 |
| 2022 | 2 |
| 2023 | 3 |
| 2024 | 3 |
| 2025 | 4 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Liquid Electrolyte Composition Comprising a Salt, Electrochemical Cell Comprising the Electrolyte Composition, Salt, and Use of the Salt in the Electrochemical Cell
US-2025226450-A1 · Jul 10, 2025 · US
Inorganic silyl and polysilyl derivatives of group v elements and methods of synthesizing the same and methods of using the same for deposition
US-2025066906-A1 · Feb 27, 2025 · US
New inorganic silyl and polysilyl derivatives of group v elements and methods of synthesizing the same and methods of using the same for deposition
US-2025051373-A1 · Feb 13, 2025 · US
Photoresist for semiconductor fabrication
US-2024385516-A1 · Nov 21, 2024 · US
Organometallic photoresists for DUV or EUV lithography
US-12135503-B2 · Nov 5, 2024 · US
Photoresist for semiconductor fabrication
US-12044966-B2 · Jul 23, 2024 · US
Photoresist for semiconductor fabrication
US-2023367208-A1 · Nov 16, 2023 · US
Photoresist for semiconductor fabrication
US-11726405-B2 · Aug 15, 2023 · US
Iodine-containing metal compound and composition for depositing thin film including the same
US-2023250114-A1 · Aug 10, 2023 · US
Organometallic photoresists for duv or euv lithography
US-2022317572-A1 · Oct 6, 2022 · US
Photoresist for semiconductor fabrication
US-2022100086-A1 · Mar 31, 2022 · US
Method for producing dialkylamido element compounds
US-2021388006-A1 · Dec 16, 2021 · US
Metal complex compounds as catalysts for polyurethane compositions
US-9732180-B2 · Aug 15, 2017 · US
Metal-organic frameworks (MOF) for gas capture
US-9593132-B2 · Mar 14, 2017 · US
Arsenoplatin anti-cancer agents
US-9499574-B2 · Nov 22, 2016 · US
Fabricating porous materials using intrepenetrating inorganic-organic composite gels
US-9365691-B2 · Jun 14, 2016 · US
Antimony and germanium complexes useful for CVD/ALD of metal thin films
US-9219232-B2 · Dec 22, 2015 · US
Arsenoplatin anti-cancer agents
US-2015218195-A1 · Aug 6, 2015 · US
Precursors For GST Films In ALD/CVD Processes
US-2015140790-A1 · May 21, 2015 · US