Composition for depositing antimony-containing thin film and method for manufacturing antimony-containing thin film using the same
US-12473647-B2 · Nov 18, 2025 · US
Antimony compounds
Antimony compounds · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07F9/90 |
| Official title | Antimony compounds |
| Display label | Antimony compounds |
| Total patents | 51 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 4 |
| 2016 | 1 |
| 2017 | 4 |
| 2018 | 4 |
| 2019 | 7 |
| 2020 | 6 |
| 2021 | 3 |
| 2022 | 4 |
| 2023 | 6 |
| 2024 | 6 |
| 2025 | 6 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Semiconductor photoresist compositions and methods of forming patterns using the compositions
US-2025347995-A1 · Nov 13, 2025 · US
Photoresist for semiconductor fabrication
US-2025341775-A1 · Nov 6, 2025 · US
Lithography compositions and methods for forming resist patterns and/or making semiconductor devices
US-2025164874-A1 · May 22, 2025 · US
Lithography compositions and methods for forming resist patterns and/or making semiconductor devices
US-2025036023-A1 · Jan 30, 2025 · US
EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands
US-12210283-B2 · Jan 28, 2025 · US
Photoresist for semiconductor fabrication
US-12153346-B2 · Nov 26, 2024 · US
Photoresist for semiconductor fabrication
US-2024385516-A1 · Nov 21, 2024 · US
Photoresist for semiconductor fabrication
US-2024377732-A1 · Nov 14, 2024 · US
Organometallic photoresists for DUV or EUV lithography
US-12135503-B2 · Nov 5, 2024 · US
Photoresist for semiconductor fabrication
US-12044966-B2 · Jul 23, 2024 · US
Photoacid generators, photoresist compositions, and pattern formation methods
US-2024027905-A1 · Jan 25, 2024 · US
Photoresist for semiconductor fabrication
US-2023367208-A1 · Nov 16, 2023 · US
Euv Photoresist With Low-Activation-Energy Ligands Or High-Developer-Solubility Ligands
US-2023305396-A1 · Sep 28, 2023 · US
Photoresist for semiconductor fabrication
US-11726405-B2 · Aug 15, 2023 · US
Composition for depositing antimony-containing thin film and method for manufacturing antimony-containing thin film using the same
US-2023203655-A1 · Jun 29, 2023 · US
EUV photoresist with low-activation-energy ligands or high-developer-solubility ligands
US-11681221-B2 · Jun 20, 2023 · US
Polycyclic aromatic compound
US-11653565-B2 · May 16, 2023 · US
Organometallic photoresists for duv or euv lithography
US-2022317572-A1 · Oct 6, 2022 · US
Silyl ester phosphinates as electrolyte additives
US-11404723-B2 · Aug 2, 2022 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07F9/90?
- CPC C07F9/90 is the Cooperative Patent Classification code for “Antimony compounds.”
- How many patents are filed under CPC C07F9/90 (Antimony compounds)?
- Our database includes 51 publications tagged with this CPC code.
- Is patent activity under CPC C07F9/90 growing?
- Publication counts under this code: 6 in 2024 vs 6 in 2025 (latest complete years).