Monomer, resin for photoresist, resin composition for photoresist, and pattern forming method
US-12498638-B2 · Dec 16, 2025 · US
one oxygen atom and one sulfur atom
one oxygen atom and one sulfur atom · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07D327/02 |
| Official title | one oxygen atom and one sulfur atom |
| Display label | one oxygen atom and one sulfur atom |
| Total patents | 25 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 3 |
| 2016 | 4 |
| 2017 | 6 |
| 2018 | 4 |
| 2020 | 2 |
| 2021 | 3 |
| 2022 | 2 |
| 2025 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Monomers, polymers and photoresist compositions
US-11487203-B2 · Nov 1, 2022 · US
Monomer, resin for photoresist, resin composition for photoresist, and pattern forming method
US-2022267494-A1 · Aug 25, 2022 · US
Electrolyte, electrochemical device and electronic device containing the same
US-11165097-B2 · Nov 2, 2021 · US
Urea-oxaziridines
US-11155530-B2 · Oct 26, 2021 · US
Urea-Oxaziridines
US-2021155600-A1 · May 27, 2021 · US
Insecticidal compounds
US-10869477-B2 · Dec 22, 2020 · US
Electrolyte, electrochemical device and electronic device containing the same
US-2020243905-A1 · Jul 30, 2020 · US
Monomers, polymers and photoresist compositions
US-2018203352-A1 · Jul 19, 2018 · US
Insecticidal compounds
US-2018153170-A1 · Jun 7, 2018 · US
Insecticidal compounds
US-9913471-B2 · Mar 13, 2018 · US
Cyclic compound and optical material composition including same
US-9902708-B2 · Feb 27, 2018 · US
Novel cyclic compound and optical material composition including same
US-2017334876-A1 · Nov 23, 2017 · US
Salt, acid generator, resist composition and method for producing resist pattern
US-9771346-B2 · Sep 26, 2017 · US
Insecticidal compounds
US-2017071207-A1 · Mar 16, 2017 · US
Salt, acid generator, photoresist composition, and method for producing photoresist pattern
US-9580402-B2 · Feb 28, 2017 · US
Photoresist composition and method for producing photoresist pattern
US-9575408-B2 · Feb 21, 2017 · US
Insecticidal compounds
US-9545106-B2 · Jan 17, 2017 · US
Salt, acid generator, photoresist composition, and method for producing photoresist pattern
US-2016200702-A1 · Jul 14, 2016 · US
Photoresist composition and method for producing photoresist pattern
US-2016195809-A1 · Jul 7, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07D327/02?
- CPC C07D327/02 is the Cooperative Patent Classification code for “one oxygen atom and one sulfur atom.”
- How many patents are filed under CPC C07D327/02 (one oxygen atom and one sulfur atom)?
- Our database includes 25 publications tagged with this CPC code.
- Is patent activity under CPC C07D327/02 growing?
- Publication counts under this code: 2 in 2022 vs 1 in 2025 (latest complete years).