Salt, acid generator, photoresist composition, and method for producing photoresist pattern

Patent metadata

Field	Value
Publication number	US-9580402-B2
Application number	US-201614988156-A
Country	US
Kind code	B2
Filing date	Jan 5, 2016
Priority date	Jan 8, 2015
Publication date	Feb 28, 2017
Grant date	Feb 28, 2017

Abstract

A salt represented by the formula (I):

wherein
R 1 represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group;
Q 1 and Q 2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
A 1 represents a lactone ring-containing group which has 4 to 24 carbon atoms;
R 2 represents an acid-labile group; and
“m” represents an integer of 0 to 3.

First claim

What is claimed is:

1. A salt represented by the formula (I):

wherein
R 1 each independently represents a C1 to C12 alkyl group in which a methylene group can be replaced by an oxygen atom or a carbonyl group;
Q 1 and Q 2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group;
A 1 represents a lactone ring-containing group which has 4 to 24 carbon atoms;
R 2 represents an acid-labile group; and
“m” represents an integer of 0 to 3.

2. The salt according to claim 1 wherein
A 1 represents a group which has a norbornanelactone ring.

3. The salt according to claim 1 wherein
R 2 is represented by formula (R2-1):

wherein R 2a1 , R 2a2 and R 2a3 independently each represent a C1 to C8 alkyl group, a C3 to C20 alicyclic hydrocarbon group or a group composed of the alkyl group and the alicyclic hydrocarbon group, or R 2a1 and R 2a2 can be bonded each other to form a C3 to C20 divalent alicyclic hydrocarbon group together with the carbon atom bonded to R 2a1 and R 2a2 , and * represents a binding site; or
formula (R2-2):

wherein R 2a1′ and R 2a2′ independently each represent a hydrogen atom or a C1 to C12 hydrocarbon group, and R 2a3′ represents a C1 to C20 hydrocarbon group, or R 2a2′ and R 2a3′ can be bonded each other to form a C2 to C20 divalent heterocyclic group together with X 2a1′ and the carbon atom bonded to R 2a2′ and R 2a3′ , and a methylene group in the hydrocarbon group and the heterocyclic group can be replaced by —O— or —S—, X 2a1′ represents an oxygen atom or a sulfur atom, and * represents a binding site.

4. An acid generator which comprises the salt according to claim 1 .

5. A photoresist composition which comprises the salt according to claim 1 and a resin having an acid-labile group.

6. A photoresist composition which comprises the salt according to claim 1 and a resin having an acid-labile group, and which further comprises a salt which generates an acid weaker in acidity than an acid generated from the salt according to claim 1 .

7. A process for producing a photoresist pattern comprising the following steps (1) to (5):
(1) a step of applying the photoresist composition according claim 5 on a substrate,
(2) a step of forming a composition film by conducting drying,
(3) a step of exposing the composition film to radiation,
(4) a step of baking the exposed composition film, and
(5) a step of developing the baked composition film.

Assignees

• Sumitomo Chemical Co

Inventors

• Sakamoto Hiromu
• Ichikawa Koji

Classifications

• C07C309/04

  containing only one sulfo group · CPC title

• C07D333/46

  substituted on the ring sulfur atom · CPC title

• C07D327/02

  one oxygen atom and one sulfur atom · CPC title

• G03F7/2041

  in the presence of a fluid, e.g. immersion; using fluid cooling means · CPC title

• C07D337/04

  not condensed with other rings · CPC title