Monomers, polymers and photoresist compositions

Patent metadata

Field	Value
Publication number	US-11487203-B2
Application number	US-201715858129-A
Country	US
Kind code	B2
Filing date	Dec 29, 2017
Priority date	Dec 30, 2016
Publication date	Nov 1, 2022
Grant date	Nov 1, 2022

Abstract

Monomers and polymers are provided that comprise a carbon alicyclic group or heteroalicyclic group that comprises 1) one or more acid-labile ring substituents and 2) one or more ether or thioether ring substituents. Photoresists that comprise such polymers also are provided.

First claim

What is claimed is:

1. A polymer comprising a repeat unit that comprises a structure corresponding to the following Formulae (I) or (I′):

wherein in each of Formulae (I) and (I′):
X and Y are independently C, O, or S and form a carbon alicyclic ring or heteroalicyclic ring;
R is a non-hydrogen substituent; R 1 is optionally substituted ether or optionally substituted thioether;
R 2 is a non-hydrogen substituent;
m is an integer an integer of 0 or greater;
n is a positive integer; and the sum of m and n do not exceed the available valances of the carbon alicyclic ring or heteroalicyclic ring.

2. A polymer of claim 1 wherein the polymer comprises a repeat unit that comprises a structure corresponding to the following Formula (II):

wherein in Formula (II):
R is a non-hydrogen substituent;
R 1 is optionally substituted ether or optionally substituted thioether;
R 2 is a non-hydrogen substituent;
m is an integer an integer of 0 (where no R 2 groups are present) or greater;
n is a positive integer; and the sum of m and n do not exceed the available valances of the carbon alicyclic ring.

3. The polymer of claim 1 wherein m is zero.

4. The polymer of claim 1 wherein R 1 is present as a 4-position substituent.

5. The polymer of claim 2 wherein R 1 is present as a 4-position substituent.

6. The polymer of claim 3 wherein n is 1.

7. The polymer of claim 4 wherein n is 1.

8. The polymer of claim 1 wherein the polymer comprises a repeat unit that comprises a structure corresponding to Formula (I).

9. The polymer of claim 1 wherein the polymer comprises a repeat unit that comprises a structure corresponding to Formula (I′).

10. A polymer that comprises a unit provided by one or more of the following:

11. A photoresist composition comprising a photoactive component and a polymer of claim 1 .

12. A photoresist composition comprising a photoactive component and a polymer of claim 2 .

13. A photoresist composition comprising a photoactive component and a polymer of claim 3 .

14. A photoresist composition comprising a photoactive component and a polymer of claim 4 .

15. A photoresist composition comprising a photoactive component and a polymer of claim 5 .

16. A photoresist composition comprising a photoactive component and a polymer of claim 6 .

17. A photoresist composition comprising a photoactive component and a polymer of claim 7 .

18. A photoresist composition comprising a photoactive component and a polymer of claim 8 .

19. A photoresist composition comprising a photoactive component and a polymer of claim 9 .

20. A photoresist composition comprising a photoactive component and a polymer of claim 10 .

Assignees

• Rohm & Haas Elect Materials Korea Ltd

Inventors

• Ryu Eui Hyun
• Kim Myung-Yeol
• Lee Woo-Hyung
• Jeong Haemi
• Im Kwang-Hwyi

Classifications

• C07C69/54 Primary

  Acrylic acid esters; Methacrylic acid esters · CPC title

• C07C323/17

  having the sulfur atom of at least one of the thio groups bound to a carbon atom of a ring other than a six-membered aromatic ring of the carbon skeleton · CPC title

• G03F7/0397 Primary

  the macromolecular compound having an alicyclic moiety in a side chain · CPC title

• C07D307/20

  Oxygen atoms · CPC title

• C07C2601/14

  The ring being saturated · CPC title