Salt, acid generator, resist composition and method for producing resist pattern

Patent metadata

Field	Value
Publication number	US-9771346-B2
Application number	US-201514968172-A
Country	US
Kind code	B2
Filing date	Dec 14, 2015
Priority date	Dec 15, 2014
Publication date	Sep 26, 2017
Grant date	Sep 26, 2017

Abstract

A salt represented by formula (I):

wherein R 1 and R 2 independently represent a hydrogen atom, a hydroxy group or a C 1 to C 12 hydrocarbon group in which a methylene group may be replaced by a —O— or —CO—; m and n independently represent 1 or 2; Ar represents an optionally substituted phenyl group; Q 1 and Q 2 independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group, A 1 represents a single bond, a C 1 to C 24 alkanediyl group or the like, and Y represents an optionally substituted C 1 to C 18 alkyl group or monovalent C 3 to C 18 alicyclic hydrocarbon group, and a methylene group therein may be replaced by a —O—, O— or —SO 2 —, provided that the alkyl group or the alicyclic hydrocarbon group has at least one substituent, or at least one methylene group contained therein is replaced by a —O—, —CO— or —SO 2 —.

First claim

What is claimed is:

1. A salt represented by formula (I):

wherein R 1 and R 2 each independently represent a hydrogen atom, a hydroxy group or a C 1 to C 12 hydrocarbon group in which a methylene group may be replaced by an oxygen atom or a carbonyl group;
m and n each independently represent 1 or 2;
Ar represents an optionally substituted phenyl group;
Q 1 and Q 2 each independently represent a fluorine atom or a C 1 to C 6 perfluoroalkyl group,
A 1 represents a single bond, a C 1 to C 24 alkanediyl group or *-A 2 -X 1 -(A 3 -X 2 ) a -(A 4 ) b ,
* represents a binding site to a carbonyl group;
A 2 , A 3 and A 4 each independently represent a C 1 to C 6 alkanediyl group,
X 1 and X 2 each independently represent —O—, —CO—O— or —O—CO—,
a represents 0 or 1,
b represents 0 or 1, and
Y represents a hydrogen atom or a monovalent C 3 to C 18 alicyclic hydrocarbon group where a hydrogen atom may be replaced by a substituent and where a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group, provided that the alicyclic hydrocarbon group has a substituent, or a methylene group contained in the alicyclic hydrocarbon group has been replaced by an oxygen atom, a carbonyl group or a sulfonyl group.

2. The salt according to claim 1 , wherein A 1 is a single bond.

3. The salt according to claim 1 , wherein Y is a C 3 to C 18 alicyclic hydrocarbon group where a hydrogen atom has been replaced by a substituent or where a methylene group has been replaced by an oxygen atom, a carbonyl group or a sulfonyl group.

4. An acid generator, which comprises the salt according to claim 1 .

5. A resist composition comprising the salt according to claim 1 and a resin having an acid-labile group.

6. The resist composition according to claim 5 , further comprising a salt which generates an acid weaker in acidity than an acid generated from the acid generator.

7. A method for producing a resist pattern comprising steps (1) to (5);
(1) applying the resist composition according to claim 5 onto a substrate;
(2) drying the applied composition to form a composition layer;
(3) exposing the composition layer;
(4) heating the exposed composition layer; and
(5) developing the heated composition layer.

Assignees

• Sumitomo Chemical Co

Inventors

• Miyagawa Takayuki
• Anryu Yukako
• Ichikawa Koji

Classifications

• G03F7/0045

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• G03F7/30

  Imagewise removal using liquid means · CPC title

• C07D321/12

  Eight-membered rings · CPC title

• C07C2603/74

  Adamantanes · CPC title

• G03F7/322

  Aqueous alkaline compositions · CPC title