Tellurium-containing polymer and compound
US-2025346723-A1 · Nov 13, 2025 · US
Compounds containing tellurium
Compounds containing tellurium · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C07C395/00 |
| Official title | Compounds containing tellurium |
| Display label | Compounds containing tellurium |
| Total patents | 36 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2016 | 3 |
| 2017 | 1 |
| 2018 | 1 |
| 2019 | 8 |
| 2020 | 4 |
| 2021 | 2 |
| 2022 | 5 |
| 2023 | 3 |
| 2024 | 6 |
| 2025 | 3 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Lithography compositions and methods for forming resist patterns and/or making semiconductor devices
US-2025164874-A1 · May 22, 2025 · US
Lithography compositions and methods for forming resist patterns and/or making semiconductor devices
US-2025036023-A1 · Jan 30, 2025 · US
Novel compound for capping layer and organic light emitting device including same
US-2024279158-A1 · Aug 22, 2024 · US
Novel compound for light emitting device and organic light emitting device including same
US-2024276871-A1 · Aug 15, 2024 · US
Organic salt, photoresist composition including the same, and pattern formation method using the same
US-2024201588-A1 · Jun 20, 2024 · US
Monomers, polymers and lithographic compositions comprising same
US-11932713-B2 · Mar 19, 2024 · US
Photoacid generators, photoresist compositions, and pattern formation methods
US-2024027905-A1 · Jan 25, 2024 · US
Salts and photoresists comprising same
US-11880134-B2 · Jan 23, 2024 · US
Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin
US-11852970-B2 · Dec 26, 2023 · US
Tellurium-containing compound, polymer, and method for producing polymer
US-2023312771-A1 · Oct 5, 2023 · US
Method for producing organic tellurium compound and method for producing vinyl polymer
US-11713294-B2 · Aug 1, 2023 · US
Zwitterion compounds and photoresists comprising same
US-11505565-B2 · Nov 22, 2022 · US
Salts and photoresists comprising same
US-11448960-B2 · Sep 20, 2022 · US
Organic tellurium compound, method for producing same, living radical polymerization initiator, method for producing vinyl polymer, and vinyl polymer
US-11427538-B2 · Aug 30, 2022 · US
Metal-containing onium salt compound, photodegradable base, resist composition, and method for manufacturing device using said resist composition
US-11347147-B2 · May 31, 2022 · US
Method for producing organic tellurium compound and method for producing vinyl polymer
US-2022009885-A1 · Jan 13, 2022 · US
Photosensitive compound, photoacid generator and resist composition containing the photosensitive compound, and method for manufacturing device using the resist composition
US-11048166-B2 · Jun 29, 2021 · US
Method for preparing a polyfluorinated compound
US-2021163408-A1 · Jun 3, 2021 · US
Mithrene and methods of fabrication of mithrene
US-10875828-B2 · Dec 29, 2020 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C07C395/00?
- CPC C07C395/00 is the Cooperative Patent Classification code for “Compounds containing tellurium.”
- How many patents are filed under CPC C07C395/00 (Compounds containing tellurium)?
- Our database includes 36 publications tagged with this CPC code.
- Is patent activity under CPC C07C395/00 growing?
- Publication counts under this code: 6 in 2024 vs 3 in 2025 (latest complete years).