Metal-containing onium salt compound, photodegradable base, resist composition, and method for manufacturing device using said resist composition

Patent metadata

Field	Value
Publication number	US-11347147-B2
Application number	US-201716344093-A
Country	US
Kind code	B2
Filing date	Oct 25, 2017
Priority date	Nov 7, 2016
Publication date	May 31, 2022
Grant date	May 31, 2022

Abstract

A metal-containing onium salt compound suitable for use as a photodegradable base of a resist composition and a resist composition using the metal-containing onium salt compound are provided, the resist composition having excellent sensitivity to ionizing radiation such as extreme ultraviolet (EUV), excellent resolution and focal depth in lithography, and can reduce line width roughness (LWR) in a fine pattern. The onium salt compound including a specific metal is used as the photodegradable base.

First claim

What is claimed is:

1. A metal-containing onium salt compound represented by the following Formula (1),
(R 1 3 M-Ar 1 —Y + R 2 ) n X −   (1)

wherein in the above Formula (1):
each of R 1 and R 2 is independently an alkyl group having 1 to 20 carbon atoms or an aryl group having 5 to 20 carbon atoms, where a part or all of hydrogen atoms of the alkyl group and the aryl group may be substituted;
Ar 1 is an arylene group having 5 to 20 carbon atoms, where a part or all of hydrogen atoms of the arylene group may be substituted;
the alkyl group may contain a hetero atom-containing group instead of at least one methylene group thereof, and the aryl group and the arylene group may contain a hetero atom instead of at least one carbon atom in ring structure thereof;
M is;
Y is any one selected from the group consisting of an iodine atom, a sulfur atom, a selenium atom and a tellurium atom;
n is 1 when Y is the iodine atom, and n is 2 when Y is any one selected from the group consisting of the sulfur atom, the selenium atom and the tellurium atom;
any two or more of Ar 1 and two R 2 may be bonded to each other to form a ring structure with Y bonded thereto, and the ring structure may contain a hetero atom; and
X − is an anion.

2. The metal-containing onium salt compound according to claim 1 , wherein the metal-containing onium salt compound is represented by the following Formula (2) or (3),

where each of R 1 , R 2 , M, Ar 1 and X − in the above Formulae (2) and (3) is the same as each of R 1 , R 2 , M, Ar 1 and X − in the above Formula (1).

3. A photodegradable base comprising the metal-containing onium salt according to claim 1 .

4. A resist composition comprising the photodegradable base according to claim 3 .

5. The resist composition according to claim 4 , further comprising:
a photoacid generator; and
an acid-reactive compound.

6. The resist composition according to claim 5 , wherein the acid-reactive compound is at least one selected from the group consisting of: a compound having a protecting group to be deprotected by acid; a compound having a polymerizable group to be polymerized by acid; and a crosslinking agent exerting a crosslinking action by acid.

7. A method for manufacturing a device comprising:
forming a resist film on a substrate using the resist composition according to claim 4 ;
exposing the resist film; and
obtaining a resist pattern by developing an exposed resist film.

8. The method according to claim 7 , wherein the exposing the resist film is carried out using electron beam or extreme ultraviolet.

9. The metal-containing onium salt compound according to claim 1 , wherein Y is any one selected from the group consisting of the iodine atom, the sulfur atom and the tellurium atom.

10. The metal-containing onium salt compound according to claim 9 , wherein a cation of the metal-containing onium salt compound is a monocation.

Assignees

• Toyo Gosei Co Ltd

Inventors

• Naito Michiya
• Hayakawa Masamichi
• Utsumi Yoshiyuki

Classifications

• G03F7/039 Primary

  Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023) · CPC title

• C07C309/12

  containing esterified hydroxy groups bound to the carbon skeleton · CPC title

• C07F7/2208 Primary

  Compounds having tin linked only to carbon, hydrogen and/or halogen · CPC title

• G03F7/0045

  with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors · CPC title

• G03F7/038

  Macromolecular compounds which are rendered insoluble or differentially wettable (G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021) · CPC title