Photosensitive compound, photoacid generator and resist composition containing the photosensitive compound, and method for manufacturing device using the resist composition

Patent metadata

Field	Value
Publication number	US-11048166-B2
Application number	US-201716339014-A
Country	US
Kind code	B2
Filing date	Dec 20, 2017
Priority date	Dec 21, 2016
Publication date	Jun 29, 2021
Grant date	Jun 29, 2021

Abstract

A photosensitive compound which can be suitably used for a resist composition having superior sensitivity with respect to light of short wavelength such as KrF and the like, especially to extreme ultraviolet or electron beam, superior resolution and depth of focus in lithography, and can suppress LER (line edge roughness) in fine pattern, a resist composition using the photosensitive compound, and a manufacturing method of a device is provided. A photosensitive compound including a divalent Te atom is provided.

First claim

The invention claimed is:

1. A resist composition comprising:
a photoacid generator; and
a compound including a protecting group to be deprotected by acid,
wherein: the photoacid generator contains a skeleton selected from the group consisting of an onium salt skeleton, a diazomethane skeleton, an imide skeleton and an oxime skeleton; and
the skeleton comprises a Te atom containing group represented by the following formula (1):
*—Te—R 1   (1)

where in the formula (1), each of R 1 is independently selected from the group consisting of a linear, branched, or cyclic hydrocarbon group having 2 to 20 carbon atoms, and an aryl group having 5 to 20 carbon atoms;
the linear hydrocarbon group is selected from the group consisting of ethyl, n-propyl and n-butyl;
a part of or all of hydrogen atoms of the hydrocarbon group and the aryl group can be substituted by a first substituent group;
when the hydrocarbon group includes at least one methylene group, a group including a divalent hetero atom can be included in place of the at least one methylene group;
the aryl group can include a hetero atom in place of at least one carbon atom in a cyclic structure; and
* represents a bonding portion with the skeleton.

2. The resist composition of claim 1 , wherein the photoacid generator is represented by the following formula (2):

where in the formula (2), Y represents an atom selected from the group consisting of an iodine atom, a sulfur atom, a selenium atom, and a tellurium atom;
when Y is the iodine atom, n is 2;
when Y is either one selected from the group consisting of the sulfur atom, the selenium atom, and the tellurium atom, n is 3;
R 2 is independently selected from each other from the same candidates for the R 1 , and at least one of R 2 contains the Te atom containing group as a second substituent group in place of at least one hydrogen atom;
two or more of R 2 can be bonded to each other to form a ring structure with Y, the ring structure can include a hetero atom; and
X” represents an anion.

3. The resist composition of claim 1 , further comprising a second photoacid generator.

4. A method for manufacturing a device comprising:
forming a resist film on a substrate by using the resist composition of claim 1 ;
exposing the resist film carried out by using electron beam or extreme ultraviolet; and
forming a resist pattern by developing the exposed resist film.

5. The resist composition of claim 1 ,
wherein: the onium salt skeleton has a cation atom selected from the group consisting of an iodine atom, a sulfur atom, a selenium atom, and a tellurium atom; and
the imide skeleton is represented by the following formula (3):

where in the formula (3), at least one of R b and R C includes the Te atom containing group in the formula (1);
R b represents a group selected from the group consisting of: an alkyl group having 1 to 8 carbon atoms; an alkenyl group having 2 to 8 carbon atoms; an alkoxyalkyl group having 1 to 8 carbon atoms; and an aryl group;
a part of or all of hydrogen atoms of R b can be substituted with a third substituent group;
R C represents a group selected from the group consisting of: an arylene group having 6 to 10 carbon atoms; an alkylene group having 1 to 6 carbon atoms; and an alkenylene group having 2 to 6 carbon atoms; and
a part of or all of hydrogen atoms of RC can be substituted with a fourth substituent group.

Assignees

• Toyo Gosei Co Ltd

Inventors

• Naito Michiya
• Hayakawa Masamichi
• Utsumi Yoshiyuki

Classifications

• G03F7/004 Primary

  Photosensitive materials (G03F7/12, G03F7/14 take precedence) · CPC title

• C07F11/00

  Compounds containing elements of Groups 6 or 16 of the Periodic Table · CPC title

• Y02P20/55

  Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups · CPC title

• C07C309/12 Primary

  containing esterified hydroxy groups bound to the carbon skeleton · CPC title

• G03F7/20

  Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) · CPC title