Si-containing film forming precursors and methods of using the same
US-11820654-B2 · Nov 21, 2023 · US
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containing also one or more halogen atoms
containing also one or more halogen atoms · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C01B21/088 |
| Official title | containing also one or more halogen atoms |
| Display label | containing also one or more halogen atoms |
| Total patents | 11 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2017 | 1 |
| 2019 | 4 |
| 2021 | 3 |
| 2022 | 1 |
| 2023 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Si-containing film forming precursors and methods of using the same
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SiH-free vinyldisilanes
US-11485642-B2 · Nov 1, 2022 · US
Si-containing film forming precursors and methods of using the same
US-2021395890-A1 · Dec 23, 2021 · US
Si-containing film forming precursors and methods of using the same
US-11124876-B2 · Sep 21, 2021 · US
Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
US-2021225635-A1 · Jul 22, 2021 · US
Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
US-2019362961-A1 · Nov 28, 2019 · US
Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
US-2019311894-A1 · Oct 10, 2019 · US
SiH-Free Vinyldisilanes
US-2019284055-A1 · Sep 19, 2019 · US
Si-containing film forming precursors and methods of using the same
US-10403494-B2 · Sep 3, 2019 · US
Si-containing film forming precursors and methods of using the same
US-9777025-B2 · Oct 3, 2017 · US