Process chamber having separate process gas and purge gas regions
US-9870919-B2 · Jan 16, 2018 · US
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Kuppurao Satheesh patents
Kuppurao Satheesh holds 4 patents in our database, with recent filings and technology areas summarized below.
| Metric | Value |
|---|---|
| Total patents | 4 |
| Recent patents | 0 |
| First publication | Mar 31, 2015 |
| Latest publication | Jan 16, 2018 |
Filing trend
Year-over-year patent counts for this assignee.
Recent patents
Latest publications where this party is an assignee.
Semiconductor substrate processing system
US-9512520-B2 · Dec 6, 2016 · US
Methods for depositing layers having reduced interfacial contamination
US-9058988-B2 · Jun 16, 2015 · US
Apparatus to control semiconductor film deposition characteristics
US-8991332-B2 · Mar 31, 2015 · US
Notable patents
Representative or frequently cited publications from precomputed assignee stats.
Process chamber having separate process gas and purge gas regions
US-9870919-B2 · Jan 16, 2018 · US
Semiconductor substrate processing system
US-9512520-B2 · Dec 6, 2016 · US
Methods for depositing layers having reduced interfacial contamination
US-9058988-B2 · Jun 16, 2015 · US
Apparatus to control semiconductor film deposition characteristics
US-8991332-B2 · Mar 31, 2015 · US
Technology areas
Mapped technology topics for this assignee.
| Technology | Patents |
|---|---|
| Electricity | 4 |
| Chemistry & Metallurgy | 3 |