Enhanced performance metallic based optical mirror substrates

US9971073B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9971073-B2
Application numberUS-201514679339-A
CountryUS
Kind codeB2
Filing dateApr 6, 2015
Priority dateApr 14, 2014
Publication dateMay 15, 2018
Grant dateMay 15, 2018

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A method for coating substrates is provided. The method includes diamond turning a substrate to a surface roughness of between about 60 Å and about 100 Å RMS, wherein the substrate is one of a metal and a metal alloy. The method further includes polishing the diamond turned surface of the substrate to a surface roughness of between about 10 Å and about 25 Å to form a polished substrate, heating the polished substrate, and ion bombarding the substrate with an inert gas. The method includes depositing a coating including at least one metallic layer on the ion bombarded surface of the substrate using low pressure magnetron sputtering, and polishing the coating to form a finished surface having a surface roughness of less than about 25 Å RMS using a glycol based colloidal solution.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for coating substrates, the method comprising: diamond turning a substrate to a surface roughness of between about 60 Å and about 100 Å RMS, wherein the substrate is one of a metal and a metal alloy; polishing the diamond turned surface of the substrate to a surface roughness of between about 10 Å and about 25 Å to form a polished substrate; heating the polished substrate; ion bombarding the polished substrate with an inert gas; depositing a coating comprising at least one metallic layer on the ion bombarded surface of the polished substrate using low pressure magnetron sputtering; and polishing the coating to form a finished surface having a surface roughness of less than about 25 Å RMS using a glycol based colloidal solution. 2. The method of claim 1 , wherein the substrate is selected from the group consisting of aluminum, aluminum alloys, magnesium and magnesium alloys. 3. The method of claim 1 , wherein the metallic layer comprises a material selected from the group consisting of aluminum, aluminum alloys, magnesium and magnesium alloys. 4. The method of claim 1 , wherein the coating has a thickness of between about 2.0 μm and about 10 μm. 5. The method of claim 1 , wherein the glycol based colloidal solution has a pH of between about 8.5 and about 9.5. 6. The method of claim 1 , wherein the finished surface has a peak to valley (PV) roughness of less than about 30 nm. 7. The method of claim 1 , wherein depositing a coating further comprises depositing an adhesion layer on the ion bombarded surface of the polished substrate and depositing the metallic layer on the adhesion layer. 8. The method of claim 7 , wherein depositing a coating further comprises depositing an intermediate layer on the adhesion layer, the intermediate layer comprising a material selected from the group consisting of an aluminum oxide, aluminum nitride and aluminum oxynitride. 9. The method of claim 1 , further comprising depositing at least one smoothing layer, the at least one smoothing layer comprising aluminum oxide. 10. The method of claim 1 , wherein the polished substrate is heated to a temperature between 50° C. and 150° C. for a time period between 1.0 hour and 2.0 hours. 11. The method of claim 1 , wherein the polished substrate is ion bombarded with the inert gas for a time period between 15 min and 30 min.

Assignees

Inventors

Classifications

  • Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing · CPC title

  • by cathodic sputtering · CPC title

  • Protective coatings, e.g. hard coatings · CPC title

  • with acidic solutions · CPC title

  • C23C14/588Primary

    by mechanical treatment · CPC title

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What does patent US9971073B2 cover?
A method for coating substrates is provided. The method includes diamond turning a substrate to a surface roughness of between about 60 Å and about 100 Å RMS, wherein the substrate is one of a metal and a metal alloy. The method further includes polishing the diamond turned surface of the substrate to a surface roughness of between about 10 Å and about 25 Å to form a polished substrate, heating…
Who is the assignee on this patent?
Corning Inc
What technology area does this patent fall under?
Primary CPC classification C23C14/588. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 15 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).