Apparatus and method for manufacturing SiO

US10046973B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10046973-B2
Application numberUS-201414587848-A
CountryUS
Kind codeB2
Filing dateDec 31, 2014
Priority dateMay 16, 2013
Publication dateAug 14, 2018
Grant dateAug 14, 2018

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Disclosed is an apparatus and method for manufacturing SiO, which may lower a manufacturing cost of SiO by collecting SiO continuously. The apparatus for manufacturing SiO includes a reaction unit configured to receive a SiO-making material and bring the received material into reaction by heating to generate a SiO gas; and a collecting unit configured to maintain an internal temperature lower than an internal temperature of the reaction unit, the collecting unit including a rotating member in an inner space thereof, wherein the collecting unit collects a SiO deposit by introducing the SiO gas generated by the reaction unit through an inlet formed at least at one side thereof and allowing the introduced SiO gas to be deposited to a surface of the rotating member.

First claim

Opening claim text (preview).

What is claimed is: 1. An apparatus for manufacturing SiO, comprising: a reaction unit configured to receive a SiO-making material and bring the received material into reaction by heating to generate a SiO gas; and a collecting unit configured to maintain an internal temperature lower than an internal temperature of the reaction unit, the collecting unit including a rotating member in an inner space thereof, wherein the rotating member includes a belt and at least two wheels, and wherein at least one of the wheels has a circular shape and at least one of the wheels has a polygonal shape in a front form thereof, and wherein the at least one wheel having the polygonal shape is disposed at a lower portion of the rotating member than the at least one wheel having the circular shape, wherein the collecting unit collects a SiO deposit by introducing the SiO gas generated by the reaction unit through an inlet formed at least at one side thereof and allowing the introduced SiO gas to be deposited to a surface of the rotating member, and wherein the collecting unit further includes a removing member for separating the SiO deposit from the surface of the rotating member by injecting a gas to the surface of the rotating member and controls the internal temperature by means of the gas injected by the removing member. 2. The apparatus for manufacturing SiO according to claim 1 , wherein the gas introduced through the inlet is deposited to a surface of the belt. 3. The apparatus for manufacturing SiO according to claim 2 , wherein the collecting unit rotates the at least two wheels to move the belt while the SiO gas is being introduced. 4. The apparatus for manufacturing SiO according to claim 1 , wherein at least one of the wheels has unevenness on a surface thereof which is in contact with the belt. 5. The apparatus for manufacturing SiO according to claim 4 , wherein the unevenness is formed in a rotating direction of the wheel. 6. The apparatus for manufacturing SiO according to claim 1 , wherein the rotating member includes three or more wheels, and the belt has three or more bent portions. 7. The apparatus for manufacturing SiO according to claim 6 , wherein the inlet is formed in an upper portion of the collecting unit, and wherein the rotating member is formed so that a length direction of an upper portion of the belt is a horizontal direction. 8. The apparatus for manufacturing SiO according to claim 1 , wherein the collecting unit cools the surface of the rotating member by means of the gas injected by the removing member.

Assignees

Inventors

Classifications

  • by mechanical treatment · CPC title

  • C01B33/113Primary

    Silicon oxides; Hydrates thereof {(preparing monoxide by reduction of siliceous material C01B33/182)} · CPC title

  • Vacuum evaporation · CPC title

  • Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks · CPC title

  • for coating elongated substrates · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10046973B2 cover?
Disclosed is an apparatus and method for manufacturing SiO, which may lower a manufacturing cost of SiO by collecting SiO continuously. The apparatus for manufacturing SiO includes a reaction unit configured to receive a SiO-making material and bring the received material into reaction by heating to generate a SiO gas; and a collecting unit configured to maintain an internal temperature lower t…
Who is the assignee on this patent?
Lg Chemical Ltd
What technology area does this patent fall under?
Primary CPC classification C01B33/113. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 14 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).