Sensor system and device
US-10151725-B2 · Dec 11, 2018 · US
US9964451B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9964451-B2 |
| Application number | US-201314389089-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 26, 2013 |
| Priority date | Mar 30, 2012 |
| Publication date | May 8, 2018 |
| Grant date | May 8, 2018 |
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Provided is a temperature sensor which does not easily cause a crack in a Ti—Al—N-based thermistor material layer when the film is bent, can be directly deposited on a film or the like without firing, and has a high reliability with a high heat resistance. The temperature sensor includes an insulating film 2 , a thin film thermistor portion 3 made of a Ti—Al—N-based thermistor material formed on the insulating film, a pair of pattern electrodes 4 formed on the insulating film with a pair of opposed electrode portions 4 a being arranged so as to be opposed to each other on the thin film thermistor portion, wherein the pair of opposed electrode portions covers the entire surface of thin film thermistor portion excluding the region between the opposed electrode portions.
Opening claim text (preview).
What is claimed is: 1. A temperature sensor comprising: an insulating film; a thin film thermistor made of a Ti—Al—N-based thermistor material on the insulating film; and a pair of pattern electrodes formed on the insulating film with a pair of opposed electrode portions being arranged so as to be opposed to each other on the thin film thermistor, wherein the pair of the opposed electrode portions covers the entire surface of the thin film thermistor excluding the region between the opposed electrode portions. 2. The temperature sensor according to claim 1 , wherein the pair of opposed electrode portions further expands to the outside of an outer border of the thin film thermistor, and covers the surroundings of the thin film thermistor. 3. The temperature sensor according to claim 1 , wherein the thin film thermistor consists of a metal nitride represented by the general formula: Ti x Al y N z (where 0.70≤y/(x+y)≤0.95, 0.4≤z≤0.5, and x+y+z=1), wherein the crystal structure thereof is a hexagonal wurtzite-type single phase.
using microstructures, e.g. silicon spreading resistance · CPC title
having negative temperature coefficient · CPC title
Thermistors (H01C7/02 - H01C7/06 take precedence) · CPC title
the element being a non-linear resistance, e.g. thermistor (G01K7/26 takes precedence) · CPC title
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