Substrate holding and rotating device, substrate processing device equipped with same, and substrate processing method

Patent metadata

Field	Value
Publication number	US-9962744-B2
Application number	US-201414891522-A
Country	US
Kind code	B2
Filing date	Mar 31, 2014
Priority date	Jun 18, 2013
Publication date	May 8, 2018
Grant date	May 8, 2018

Abstract

A substrate treatment apparatus includes a turntable, a rotative drive unit, a holding pin provided on the turntable, a protection disk for covering a lower surface of a substrate, and a magnetic levitation mechanism that levitates the protection disk from the turntable. The protection disk is vertically movable relative to the turntable between a lower position and an adjacent position above the lower position and close to a lower surface of the substrate. The magnetic levitation mechanism includes a protection disk permanent magnet and an annual guard permanent magnet held by a splash guard. When a guard drive mechanism moves up the splash guard, the protection disk is levitated from the turntable and held at the adjacent position by a magnetic repulsive force generated between the permanent magnets.

First claim

What is claimed is:

1. A substrate holding and rotating device, comprising:
a turntable rotatable about a vertical rotation axis;
a rotative drive unit which rotates the turntable;
a holding member provided on the turntable such that the holding member rotates together with the turntable, the holding member extending upwardly from the turntable, the holding member being movable between a holding position at which the holding member horizontally holds a substrate in a state in which the turntable and the substrate are spaced in a vertical direction and a retracted position to which the holding member is retracted from the holding position;
a protection disk including an opening which surrounds a whole circumference of the holding member, a lower surface disposed between the turntable and the substrate held by the holding member, and a lateral side covering portion which covers a space defined between the lower surface of the protection disk and the substrate held by the holding member from a lateral side of the space, the protection disk disposed between the turntable and the substrate held by the holding member, the protection disk being vertically movable relative to the turntable between a lower position and an adjacent position above the lower position and close to a lower surface of the substrate held by the holding member, the protection disk attached to the turntable so as to rotate about the rotation axis together with the turntable, the protection disk being larger than the substrate held by the holding member;
a magnetic levitation mechanism including a first magnet attached to the protection disk, a second magnet which has an annular shape coaxial about the rotation axis and generates a repulsive force with respect to the first magnet, a first support member which non-rotatably supports the second magnet, and a first relative movement mechanism which moves the first support member and the turntable relative to each other so as to change a distance between the first magnet and the second magnet, the magnetic levitation mechanism being configured to levitate the protection disk from the turntable by the repulsive force generated between the first magnet and the second magnet; and
a magnetic drive mechanism including a first magnetic member attached to the holding member, a second magnetic member which has an annular shape coaxial about the rotation axis and generates a magnetic force with respect to the first magnetic member, a second support member which non-rotatably supports the second magnetic member, and a second relative movement mechanism which is separate from the first relative movement mechanism and moves the second support member and the turntable relative to each other so as to change a distance between the first magnetic member and the second magnetic member, the magnetic drive mechanism being configured to hold the holding member at the holding position by the magnetic force generated between the first magnetic member and the second magnetic member.

2. The substrate holding and rotating device according to claim 1 , further comprising a limitation member which limits an upward relative movement of the protection disk with respect to the turntable at the adjacent position.

3. The substrate holding and rotating device according to claim 1 , further comprising a guide mechanism which is provided on the turntable and guides the vertical relative movement of the protection disk.

4. The substrate holding and rotating device according to claim 1 , further comprising an inert gas supply unit which supplies an inert gas to a space defined between a substrate held and rotated by the holding member and the protection disk located at the adjacent position.

5. The substrate holding and rotating device according to claim 4 , wherein
an upper surface of the protection disk includes an opposing portion which is disposed under the substrate held by the holding member, an inwardly facing portion which extends upwardly from an outer circumference of the opposing portion, and an outer circumferential portion which extends outwardly from an upper end of the inwardly facing portion, and defines a restriction portion, which restricts an inert gas flow passage at a peripheral edge of the substrate held by the holding member, by the inwardly facing portion and the outer circumferential portion.

6. The substrate holding and rotating device according to claim 4 , wherein
the inert gas supply unit includes an inert gas nozzle which ejects the inert gas radially toward a peripheral edge of the substrate held by the holding member from a rotation center of the turntable.

7. The substrate holding and rotating device according to claim 1 , further comprising a height sensor which detects a height of the protection disk between the lower position and the adjacent position.

8. The substrate holding and rotating device according to claim 7 , wherein
the substrate holding and rotating device further comprising a moving member which moves an up-down direction together with the protection disk, and
the height sensor detects the height of the protection disk by detecting a height of the moving member.

9. A substrate treatment apparatus comprising:
a substrate holding and rotating device according to claim 1 ; and
a treatment liquid supply unit which supplies a treatment liquid to an upper surface of a substrate held by the substrate holding and rotating device.

10. The substrate treatment apparatus according to claim 9 , wherein
the substrate treatment apparatus further comprising a receiving member which receives a treatment liquid supplied from the treatment liquid supply unit to the substrate held by the substrate holding and rotating device and discharged outward from the upper surface of the substrate, and
the second support member is fixed to the receiving member, and
the second relative movement mechanism is configured to move the receiving member and the turntable relative to each other.

11. The substrate holding and rotating device according to claim 1 , wherein
the magnetic levitation mechanism further includes a magnet retaining member which retains the first magnet and is fixed to the protection disk.

12. A substrate treatment method comprising:
a holding step of horizontally holding a substrate by a holding member, the holding member provided on a turntable rotatable about a rotation axis extending along a vertical direction, the holding member being movable between a holding position at which the holding member holds the substrate in a state in which the turntable and the substrate are spaced in the vertical direction and a retracted position to which the holding member is retracted from the holding position;
a rotating step of rotating the turntable so as to rotate the substrate held by the holding member;
a lower surface covering step of levitating a protection disk with respect to the turntable to an adjacent position, at which the protection disk is close to a lower surface of the substrate, by a repulsive force generated between a first magnet and an annular second magnet to cover the lower surface of the substrate, the first magnet attached to the protection disk, the second magnet non-rotatably provided coaxially about the rotation axis, the protection disk attached to the turntable in relatively vertically movable manner, the protection disk including an opening which surrounds a whole circumference of the holding member, the protection disk being larger than the substrate;
a lateral side step of causing, in parallel to the lower surface covering step, a lateral side covering portion of the protection disk to cover a space defined between a lower surface of t

Assignees

• Screen Holdings Co Ltd

Inventors

• Kato Hiroshi

Classifications

• H10P72/7626

  characterised by the construction of the shaft · CPC title

• H10P72/7608

  characterised by a plurality of separate clamping members, e.g. clamping fingers · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0412 Primary

  using mainly scrubbing means, e.g. brushes · CPC title

• H10P72/0404

  for general liquid treatment, e.g. etching followed by cleaning · CPC title