Substrate cleaning apparatus and method executed in the same

US2015338328A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2015338328-A1
Application numberUS-201514717976-A
CountryUS
Kind codeA1
Filing dateMay 20, 2015
Priority dateMay 20, 2014
Publication dateNov 26, 2015
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A substrate cleaning apparatus 1 includes a cleaning member 2 that abuts on a substrate W to scrub and clean the substrate W, a holding member 6 that holds the cleaning member 2 , an air cylinder 8 that generates force to press the cleaning member 2 against the substrate W, a displacement sensor 9 that measures a position of the holding member 6 , and a control device 11 that determines the replacement time of the cleaning member 2 based on the position of the holding member 6 . The position of the holding member 6 includes a cleaning position and a non-cleaning position. The control device 11 determines the replacement time of the cleaning member 2 from change in the cleaning position while a plurality of substrates W are continuously scrubbed and cleaned.

First claim

Opening claim text (preview).

What is claimed is: 1 . A substrate cleaning apparatus, comprising: a cleaning member that abuts on a substrate to scrub and clean the substrate; a holding means that holds the cleaning member; a pressing means that is provided in the holding means and generates force to press the cleaning member against the substrate; a position measuring means that is provided in the holding means and measures a position of the holding means; and a replacement time determining means th…

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What does patent US2015338328A1 cover?
A substrate cleaning apparatus 1 includes a cleaning member 2 that abuts on a substrate W to scrub and clean the substrate W, a holding member 6 that holds the cleaning member 2 , an air cylinder 8 that generates force to press the cleaning member 2 against the substrate W, a displacement sensor 9 that measures a position of the holding member 6 , and a control device 11 that de…
Who is the assignee on this patent?
Ebara Corp
What technology area does this patent fall under?
Primary CPC classification H10P72/0412. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Nov 26 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).