High-frequency wave supplying structure

US9957610B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9957610-B2
Application numberUS-201715647305-A
CountryUS
Kind codeB2
Filing dateJul 12, 2017
Priority dateJul 27, 2016
Publication dateMay 1, 2018
Grant dateMay 1, 2018

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A high-frequency wave supplying structure includes a center conductor that extends in a specified direction, an outer conductor that is coaxial with the center conductor and grounded, and a cylindrical insulating member that is provided between the center conductor and the outer conductor. The distal end of the center conductor is a support portion that supports a workpiece W. A shield member is provided outward of the outer conductor to be coaxial with the outer conductor and the center conductor. The distal end of the shield member is located closer to the support portion in the specified direction than the distal end of the outer conductor. The insulating member includes a protruding portion that protrudes toward the support portion from an opening of the outer conductor. The protruding portion is opposed to the distal end of the outer conductor in the specified direction.

First claim

Opening claim text (preview).

The invention claimed is: 1. A high-frequency wave supplying structure employed in a film forming apparatus that performs, in a single chamber, a process of forming a metal film on a workpiece and a process using a high-frequency wave on a workpiece, the structure comprising: a center conductor that extends in a specified direction and to which a high-frequency wave is supplied; an outer conductor that is located outward of the center conductor, coaxial with the center conductor, and grounded; and a cylindrical insulating member that is provided between the center conductor and the outer conductor, wherein the center conductor includes a distal end that protrudes in the specified direction from an opening of the outer conductor, the distal end of the center conductor is a support portion that supports the workpiece, a tubular shield member is arranged outward of the outer conductor to be coaxial with the outer conductor and the center conductor, the shield member includes a distal end that is located at an end in a vicinity of the support portion in the specified direction, the outer conductor includes a distal end that is located at an end in a vicinity of the support portion in the specified direction, the distal end of the shield member is closer to the support portion in the specified direction than the distal end of the outer conductor, the insulating member includes a protruding portion that protrudes in the specified direction toward the support portion from the opening of the outer conductor, and at least one of the protruding portion and the shield member is opposed to the distal end of the outer conductor in the specified direction. 2. The high-frequency wave supplying structure according to claim 1 , wherein the insulating member includes an outer circumferential surface in the protruding portion, the outer circumferential surface of the protruding portion includes a proximal surface, and a distal surface that is closer to the support portion than the proximal surface in the specified direction, and the distal surface of the insulating member is configured to approach the center conductor toward the support portion in the specified direction. 3. The high-frequency wave supplying structure according to claim 2 , wherein the insulating member includes, in the protruding portion, a proximal section, and a distal section that is closer to the support portion than the proximal section in the specified direction, the proximal section has an outer diameter that is constant irrespective of the position in the specified direction, the distal section has an outer diameter that decreases toward the support portion in the specified direction, the proximal section has an outer circumferential surface that serves as the proximal surface, and the distal section has an outer circumferential surface that serves as the distal surface. 4. The high-frequency wave supplying structure according to claim 2 , wherein a position of the distal end of the shield member in the specified direction is closer to the support portion than a boundary portion between the proximal surface and the distal surface in the protruding portion of the insulating member. 5. The high-frequency wave supplying structure according to claim 1 , wherein the shield member has an inner diameter that is larger an outer diameter of the outer conductor, and the shield member is not grounded. 6. The high-frequency wave supplying structure according to claim 1 , wherein the shield member is made of an insulating material.

Assignees

Inventors

Classifications

  • Electricity · mapped topic

  • C23C16/274Primary

    using microwave discharges · CPC title

  • Electricity · mapped topic

  • characterised by material of construction or surface finish of the means for supporting the substrate · CPC title

  • using microwave discharges · CPC title

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Frequently asked questions

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What does patent US9957610B2 cover?
A high-frequency wave supplying structure includes a center conductor that extends in a specified direction, an outer conductor that is coaxial with the center conductor and grounded, and a cylindrical insulating member that is provided between the center conductor and the outer conductor. The distal end of the center conductor is a support portion that supports a workpiece W. A shield member i…
Who is the assignee on this patent?
Toyota Motor Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C16/274. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 01 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).