Process sheet resistance uniformity improvement using multiple melt laser exposures

Patent metadata

Field	Value
Publication number	US-9953851-B2
Application number	US-201615207226-A
Country	US
Kind code	B2
Filing date	Jul 11, 2016
Priority date	Mar 11, 2013
Publication date	Apr 24, 2018
Grant date	Apr 24, 2018

Abstract

Embodiments described herein relate to apparatus and methods of thermal processing. More specifically, apparatus and methods described herein relate to laser thermal treatment of semiconductor substrates by increasing the uniformity of energy distribution in an image at a surface of a substrate.

First claim

The invention claimed is:

1. A thermal processing apparatus, comprising:
a laser source;
a controller;
a motor coupled to the controller; and
an aperture member disposed at a focal plane of energy emitted from the laser source, wherein the aperture member is coupled to the motor, the aperture member comprising:
a transmissive portion which is substantially transparent to the energy emitted from the laser source; and
a non-transmissive portion which is substantially non-transmissive to the energy emitted from the laser source and is disposed with the transmissive portion substantially at the focal plane, wherein the non-transmissive portion is disposed between opposite sides of the transmissive portion along the optical axis.

2. The apparatus of claim 1 , wherein the transmissive portion has an opening that is substantially coplanar with the non-transmissive portion.

3. The apparatus of claim 2 , wherein the opening has a volume defined by the transmissive portion and the non-transmissive portion.

4. The apparatus of claim 1 , wherein the transmissive portion comprises a quartz or glass material.

5. The apparatus of claim 1 , wherein the non-transmissive portion is formed from an opaque material or a reflective material.

6. The apparatus of claim 5 , wherein the non-transmissive portion is formed from a reflective metallic material.

7. The apparatus of claim 5 , wherein the non-transmissive portion is a dielectric mirror.

8. The apparatus of claim 5 , wherein an interior surface of the non-transmissive portion is angled.

9. The apparatus of claim 1 , further comprising:
a side member disposed radially outward of the transmissive portion and the non-transmissive portion.

10. The apparatus of claim 9 , wherein the transmissive portion, the non-transmissive portion, and the side member are coupled by a substantially transparent adhesive.

11. The apparatus of claim 10 , wherein the substantially transparent adhesive is Canada balsam.

12. The apparatus of claim 1 , wherein the aperture member is moveable relative to the focal plane.

13. The apparatus of claim 9 , wherein the side member is an adhesive material.

14. The apparatus of claim 13 , wherein the adhesive material is impermeable to gas.

15. A thermal processing apparatus, comprising:
a laser source;
a controller;
a motor coupled to the controller; and
an aperture member coupled to the motor, the aperture member moveably disposed at a focal plane of energy emitted from the laser source, the aperture member comprising:
a transmissive portion having a first portion and a second portion, both of which are substantially transparent to the energy emitted from the laser source, the transmissive portion defining a volume between the first and second portions at the focal plane;
a non-transmissive portion which is substantially non-transmissive to the energy emitted from the laser source and is disposed between the first portion and the second portion substantially at the focal plane; and
a side member disposed radially outward of the transmissive portion and the non-transmissive portion, wherein the non-transmissive portion is disposed between opposite sides of the transmissive portion along the optical axis.

16. A thermal processing apparatus, comprising:
a laser source;
a controller;
a motor coupled to the controller; and
an aperture member coupled to the motor, the aperture member disposed at a focal plane of energy emitted from the laser source, the aperture member comprising:
a transmissive portion which is substantially transparent to the energy emitted from the laser source, the transmissive portion comprising a single portion having an annular shelf formed therein;
a non-transmissive portion which is substantially non-transmissive to the energy emitted from the laser source and is disposed within the annular shelf substantially at the focal plane; and
a side member coupled to the transmissive portion and the non-transmissive portion, wherein the non-transmissive portion is disposed between opposite sides of the transmissive portion along the optical axis.

17. The apparatus of claim 16 , wherein the transmissive portion comprises a quartz or glass material.

18. The apparatus of claim 1 , wherein the non-transmissive portion is formed from an opaque material or a reflective material.

Assignees

• Applied Materials Inc

Inventors

• Li Jiping
• Hunter Aaron Muir
• Adams Bruce E
• Vellore Kim
• Howells Samuel C
• Moffatt Stephen

Classifications

• H10P95/90

  Thermal treatments, e.g. annealing or sintering · CPC title

• H10P34/42 Primary

  with electromagnetic radiation, e.g. laser annealing (laser cutting H10P54/20) · CPC title

• H10P72/0436 Primary

  mainly by radiation · CPC title

• B23K26/034

  Observing the temperature of the workpiece · CPC title

• B23K26/066

  by using masks · CPC title