Lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9952514-B2
Application number	US-201414473795-A
Country	US
Kind code	B2
Filing date	Aug 29, 2014
Priority date	Jun 28, 2005
Publication date	Apr 24, 2018
Grant date	Apr 24, 2018

Abstract

An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.

First claim

The invention claimed is:

1. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising:
a projection system configured to project the pattern onto the substrate, the projection system having an optical axis; and
a liquid confinement structure configured to at least partly confine the liquid within the space, the liquid confinement structure comprising:
a first plate structure extending substantially parallel to a top surface of the substrate, and
a second plate structure that is substantially parallel to the first plate structure and is further in height from the top surface of the substrate than the first plate structure, the second plate structure defining at least in part an inlet opening to provide liquid to the space, the inlet opening facing toward the optical axis,
wherein the first and second plate structures have an aperture to allow transmission of the pattern and of liquid, and wherein a flow channel is provided in between the first and second plate structures, the flow channel configured to allow an outward flow of liquid in a radial direction relative to the optical axis,
wherein the inlet forms a closed loop around the aperture, an outlet of the flow channel forms a closed loop around the aperture, or both.

2. The apparatus according to claim 1 , further comprising a further outlet provided in a bottom surface of the liquid confinement structure, the further outlet configured to extract a liquid filling at least partly a space between the bottom surface of the liquid confinement structure and the substrate.

3. The apparatus according to claim 1 , wherein an outlet of the flow channel surrounds the aperture.

4. The apparatus according to claim 1 , wherein the first plate structure is movable relative to the substrate.

5. The apparatus according to claim 1 , wherein a bottom surface of the first plate structure forms part of a bottom surface of the liquid confinement structure.

6. The apparatus according to claim 1 , wherein a channel extends diagonally with respect to the optical axis to the inlet opening to supply liquid to the inlet opening.

7. The apparatus according to claim 1 , wherein the inlet is configured to provide a generally horizontal inward flow of liquid toward a center of the aperture.

8. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising:
a structure substantially parallel to the substrate to divide the space into two parts, the structure having an aperture to allow transmission of the pattern and of liquid,
an inlet to provide liquid to the space, the inlet directed towards a path of radiation through the space,
an outlet to remove liquid from the space, the outlet directed towards the path of radiation through the space, and
a further outlet provided at a bottom surface of the structure, the further outlet configured to extract a liquid filling at least partly a space between the bottom surface of the structure and the substrate,
wherein the structure is configured to allow a generally horizontal flow of the liquid from the outlet between an upper surface of the structure and a lower surface of another structure, and
wherein the inlet provides liquid above the lower surface of the other structure.

9. The apparatus according to claim 8 , wherein the outlet surrounds the aperture.

10. The apparatus according to claim 8 , wherein the inlet is at least partly defined by the other structure.

11. The apparatus according to claim 8 , wherein the structure is movable relative to the substrate.

12. The apparatus according to claim 8 , wherein the edge of the structure at the aperture is beveled.

13. The apparatus according to claim 8 , wherein the structure and the other structure are connected together to a common structure, such that the structure and the other structure are separated from a projection system configured to project the pattern onto the substrate.

14. The apparatus according to claim 8 , wherein the inlet is configured to provide a generally horizontal inward flow of liquid toward a center of the aperture.

15. A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate, the apparatus comprising:
a projection system configured to project the pattern onto the substrate, the projection system having an optical axis;
a liquid confinement structure configured to at least partly confine the liquid within the space, the liquid confinement structure comprising:
a first structure having an upper surface extending substantially parallel to a top surface of the substrate,
a second structure having a lower surface above the first structure that is substantially parallel to the upper surface of the first structure, the second structure defining at least in part an inlet opening to provide liquid to the space, the inlet opening facing toward the optical axis, and
a further outlet provided in a bottom surface of the liquid confinement structure, the further outlet configured to extract a liquid filling at least partly a space between the bottom surface of the liquid confinement structure and the substrate,
wherein the first and second structures have an aperture to allow transmission of the pattern and of liquid, and wherein a flow channel is provided in between the upper surface of the first structure and the lower surface of the second structure, the flow channel configured to allow a generally horizontal outward flow of liquid relative to a center of the aperture,
wherein the first structure is movable relative to the substrate.

16. The apparatus according to claim 15 , wherein an outlet of the flow channel surrounds the aperture.

17. The apparatus according to claim 15 , wherein a bottom surface of the first structure forms part of a bottom surface of the liquid confinement structure.

18. The apparatus according to claim 15 , wherein the first structure and the second structure are connected together to a common structure, such that the first structure and the second structure are separated from the projection system.

19. The apparatus according to claim 15 , wherein the edge of the first structure at the aperture is beveled.

20. The apparatus according to claim 15 , wherein the inlet is configured to provide a generally horizontal inward flow of liquid toward a center of the aperture.

Assignees

• Asml Netherlands Bv

Inventors

• Donders Sjoerd Nicolaas Lambertus
• Streefkerk Bob
• Leenders Martinus Hendrikus Antonius

Classifications

• G03F7/70341 Primary

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title