Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers
US-2015380299-A1 · Dec 31, 2015 · US
US9908772B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9908772-B2 |
| Application number | US-200913141420-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 18, 2009 |
| Priority date | Dec 30, 2008 |
| Publication date | Mar 6, 2018 |
| Grant date | Mar 6, 2018 |
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A nanostructured article comprises a matrix and a nanoscale dispersed phase. The nanostructured article has a random nanostructured anisotropic surface.
Opening claim text (preview).
We claim: 1. A nanostructured article comprising: a matrix and a nanoscale dispersed phase, the nanostructured article comprising a random nanostructured anisotropic surface comprising nanoscale features having a height to width ratio of 5:1 or greater, wherein the nanostructured article has a length along an x-direction, a width along a y-direction, and a thickness along a z-direction, the nanoscale features comprise nano-pillars generally in the z-direction, a majority of the nano-pillars are capped with physically exposed nanoscale dispersed phase from the nanoscale phase in the matrix, the article comprises a microstructured surface and a layer disposed on the microstructured surface such that the layer conforms to the microstructured surface at an interface between the layer and the microstructured surface, the layer comprising the nanostructured anisotropic surface, and a surface reflectivity of the nanostructured article from the nanostructured anisotropic surface is not greater than 50% of a surface reflectivity of a corresponding nanostructured article that is free of the nanostructured anisotropic surface comprising the nano-pillars capped with the physically exposed nanoscale dispersed phase. 2. The article of claim 1 , wherein the matrix comprises a polymer. 3. The article of claim 1 , wherein the matrix comprises an inorganic material. 4. The article of claim 1 , wherein the matrix comprises an alloy or a solid solution. 5. The article of claim 1 , wherein the dispersed phase comprises nanoparticles, nanotubes, or nanofibers. 6. The article of claim 1 , wherein the dispersed phase comprises caged molecules, hyperbranched molecules, micelles, or reverse micelles. 7. The article of claim 1 , wherein a percent transmission of the nanostructured anisotropic surface is about 2% or more than a percent transmission of an untreated surface. 8. The article of claim 1 , wherein the nanostructured anisotropic surface has a water contact angle of less than about 20°. 9. The article of claim 1 , wherein the nanostructured anisotropic surface absorbs about 2% or more light than an untreated surface. 10. The article of claim 1 , wherein the concentration of the dispersed phase within the matrix is between about 1 weight % and about 50 weight %. 11. The article of claim 1 , wherein the nano-pillars capped with the physically exposed nanoscale dispersed phase are directly formable via anisotropically etching the layer. 12. A nanostructured article comprising: a matrix and a nanoscale dispersed phase, the nanostructured article comprising a random nanostructured anisotropic surface comprising nanoscale features having a height to width ratio of 5:1 or greater, wherein the nanostructured article has a length along an x-direction, a width along a y-direction, and a thickness along a z-direction, the nanoscale features comprise nano-pillars generally in the z-direction, a majority of the nano-pillars are capped with physically exposed nanoscale dispersed phase from the nanoscale phase in the matrix, and the nano-pillars capped with the physically exposed nanoscale dispersed phase are directly formable via anisotropically etching a coating comprising the nanoscale dispersed phase dispersed in the matrix such that the nanoscale dispersed phase is partially embedded in the nano-pillars. 13. The nanostructured article of claim 12 , wherein the coating is disposed on a substrate. 14. The nanostructured article of claim 13 , wherein the substrate is a display.
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Regular or irregular arrays of nanoscale structures, e.g. etch mask layer (photomechanical, e.g. photolithographic, production of textured or patterned surfaces G03F7/00; lithographic processes for making patterned surfaces using printing and stamping G03F7/0002) · CPC title
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