Apparatus and method of improving beam shaping and beam homogenization

US9908200B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9908200-B2
Application numberUS-201414480415-A
CountryUS
Kind codeB2
Filing dateSep 8, 2014
Priority dateJul 31, 2007
Publication dateMar 6, 2018
Grant dateMar 6, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be square or rectangular in shape. Generally, the optical system and methods of the present invention are used to preferentially anneal one or more regions found within the anneal regions by delivering enough energy to cause the one or more regions to re-melt and solidify.

First claim

Opening claim text (preview).

The invention claimed is: 1. An apparatus for thermally processing a substrate, comprising: a plurality of energy sources, wherein each energy source is adapted to deliver an energy pulse; a first micro-lens array having a plurality of micro-lenses that are adapted to receive at least a portion of each energy pulse; a second micro-lens array having a plurality of micro-lenses that are adapted to receive at least a portion of the energy transmitted from the first micro-lens array; a first lens that is positioned to receive at least a portion of the energy transmitted from the micro-lenses in the second micro-lens array and transmit the energy received from the second micro-lens array to one or more components that are used to direct the energy received to a surface of the substrate; and a variable aberration control lens that is positioned to receive at least a portion of each energy pulse and project an image to the first micro-lens array from the received energy pulses, wherein the variable aberration control lens is configured to reduce an intensity variation between an edge of the image relative to a center of the image by reducing a first intensity at the edge of the image relative to a second intensity at the center of the image. 2. The apparatus of claim 1 , wherein the plurality of energy sources comprises three energy sources. 3. The apparatus of claim 1 , further comprising a controller operable to synchronize the energy pulses to deliver a composite energy pulse. 4. The apparatus of claim 3 , wherein the composite energy pulse has a pulse width greater than a pulse width of any of the energy pulses from the plurality of energy sources. 5. The apparatus of claim 4 , further comprising a diffuser that is positioned to receive at least a portion of the composite energy pulse and transmit the at least a portion of the composite energy pulse towards the first micro-lens array. 6. The apparatus of claim 1 , wherein the variable aberration control lens causes a higher amount of quadratic phase to be added for micro-lenses at an edge of the first micro-lens array than for micro-lenses at a center of the first micro-lens array. 7. The apparatus of claim 1 , wherein the plurality of energy sources are spatially coherent energy sources. 8. The apparatus of claim 1 , wherein the variable aberration control lens is a spherical lens. 9. An apparatus for thermally processing a substrate, comprising: an energy source assembly that has an output that is adapted to deliver a first energy pulse; a first micro-lens array having a plurality of micro-lenses that are adapted to receive at least a portion of the first energy pulse; a second micro-lens array having a plurality of micro-lenses that are adapted to receive at least a portion of the energy transmitted from the first micro-lens array; a first lens that is positioned to receive at least a portion of the energy transmitted from the micro-lenses in the second micro-lens array and transmit the energy received from the second micro-lens array to one or more components that are used to direct the energy received to a surface of the substrate; a variable aberration control lens that is positioned to receive at least a portion of the first energy pulse and project an image to the first micro-lens array from the received first energy pulse, wherein the variable aberration control lens is configured to reduce an intensity variation between an edge of the image relative to a center of the image by reducing a first intensity at the edge of the image relative to a second intensity at the center of the image; and a diffuser that is positioned to receive at least a portion of the first energy pulse and transmit the at least a portion of each energy pulse towards the first micro-lens array. 10. The apparatus of claim 9 , wherein the diffuser has a diffusion angle less than or equal to an acceptance angle of the micro-lenses in the first micro-lens array. 11. The apparatus of claim 9 , wherein the diffuser has a diffusion angle less than or equal to an acceptance angle of the micro-lenses in the second micro-lens array. 12. The apparatus of claim 9 , wherein the diffuser has a diffusion angle of between about 0.5° to 5°. 13. The apparatus of claim 9 , wherein the diffuser is positioned between the variable aberration control lens and the first micro-lens array. 14. The apparatus of claim 9 , wherein the energy source assembly comprises three or more lasers, wherein each laser is operable to deliver a portion of the first energy pulse. 15. The apparatus of claim 9 , wherein the variable aberration control lens causes a higher amount of quadratic phase to be added for micro-lenses at an edge of the first micro-lens array than for micro-lenses at a center of the first micro-lens array. 16. An apparatus for thermally processing a substrate, comprising: an energy source assembly that has an output that is adapted to deliver a first energy pulse; a first micro-lens array having a plurality of micro-lenses that are adapted to receive at least a portion of the first energy pulse; a second micro-lens array having a plurality of micro-lenses that are adapted to receive at least a portion of the energy transmitted from the first micro-lens array; a first lens that is positioned to receive at least a portion of the energy transmitted from the micro-lenses in the second micro-lens array and transmit the energy received from the second micro-lens array to one or more components that are used to direct the energy received to a surface of the substrate; and a variable aberration control lens that is positioned to receive at least a portion of the first energy pulse and project an image to the first micro-lens array from the received first energy pulse, wherein the variable aberration control lens is configured to reduce an intensity variation between an edge of the image relative to a center of the image by reducing a first intensity at the edge of the image relative to a second intensity at the center of the image. 17. The apparatus of claim 16 , wherein an amount of quadratic phase received from the variable aberration control lens at a micro-lens in the first micro-lens array is greater for a micro-lens at the edge of the first micro-lens array than for a micro-lens at the center of the first micro-lens array. 18. The apparatus of claim 16 , wherein an amount of quadratic phase added by the variable aberration control lens for each micro-lens increases for each micro-lens from the center of the first micro-lens array to the edge of the first micro-lens array. 19. The apparatus of claim 16 , further comprising a diffuser positioned before the first micro-lens array. 20. The apparatus of claim 16 , wherein the energy source assembly comprises three or more lasers, wherein each laser is operable to deliver a portion of the first energy pulse.

Assignees

Inventors

Classifications

  • having a common axis (B23K26/0619 takes precedence) · CPC title

  • Lens arrays (lens arrays per se G02B3/0006) · CPC title

  • Operations & Transport · mapped topic

  • Dividing the beam into multiple beams, e.g. multi-focusing · CPC title

  • by shaping pulses · CPC title

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Frequently asked questions

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What does patent US9908200B2 cover?
The present invention generally relates to an optical system that is able to reliably deliver a uniform amount of energy across an anneal region contained on a surface of a substrate. The optical system is adapted to deliver, or project, a uniform amount of energy having a desired two-dimensional shape on a desired region on the surface of the substrate. Typically, the anneal regions may be squ…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification B23K26/0613. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Mar 06 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).