Modular fuses and antifuses for integrated circuits

US9905511B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9905511-B2
Application numberUS-201514937812-A
CountryUS
Kind codeB2
Filing dateNov 10, 2015
Priority dateJun 28, 2013
Publication dateFeb 27, 2018
Grant dateFeb 27, 2018

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Nanoscale efuses, antifuses, and planar coil inductors are disclosed. A copper damascene process can be used to make all of these circuit elements. A low-temperature copper etch process can be used to make the efuses and efuse-like inductors. The circuit elements can be designed and constructed in a modular fashion by linking a matrix of metal columns in different configurations and sizes. The number of metal columns, or the size of a dielectric mesh included in the circuit element, determines its electrical characteristics. Alternatively, the efuses and inductors can be formed from interstitial metal that is either deposited into a matrix of dielectric columns, or left behind after etching columnar openings in a block of metal. Arrays of metal columns also serve a second function as features that can improve polish uniformity in place of conventional dummy structures. Use of such modular arrays provides flexibility to integrated circuit designers.

First claim

Opening claim text (preview).

The invention claimed is: 1. A microelectronic device comprising: a dielectric layer having a first surface; an array of metal columns extending into the dielectric layer from the first surface; and a plurality of metal links coupling a selected number of adjacent metal columns in a spiral configuration so as to form a continuous planar metal coil, a length of the spiral configuration determining an inductance of the device. 2. The microelectronic device of claim 1 wherein the array of metal columns includes one or more metal structures outside of the spiral configuration that serve as dummy structures for a metal planarization process. 3. The microelectronic device of claim 1 wherein the selected number of adjacent metal columns is programmably selected. 4. The microelectronic device of claim 1 wherein the metal columns are round cylinders. 5. The microelectronic device of claim 1 wherein the metal columns are square cylinders. 6. A microelectronic device comprising: a substrate; an array of dielectric columns on the substrate; a plurality of dielectric links on the substrate, a number of the dielectric links coupling adjacent dielectric columns in a spiral configuration; and a continuous planar metal coil contiguous to the spiral configuration, the number of adjacent dielectric columns coupled together determining an inductance of the device. 7. The microelectronic device of claim 6 wherein a subset of the dielectric columns that are located around a perimeter of the spiral configuration serve as dummy structures for a dielectric planarization process. 8. The microelectronic device of claim 6 wherein the number of adjacent dielectric columns is programmably selected. 9. The microelectronic device of claim 6 further comprising: a metal liner between the metal coil and the dielectric columns the dielectric links. 10. A method of making a microelectronic circuit element, the method comprising: forming a dielectric block; patterning the dielectric block with an array of openings; patterning the dielectric block with links to connect selected ones of the array of openings to form a geometrical shape; filling the patterned array of openings and the patterned links with metal; and planarizing the patterned dielectric block. 11. The method of claim 10 wherein the patterning the dielectric block with links including forming a planar spiral coil and the microelectronic circuit element is an inductor. 12. The method of claim 10 wherein the patterning the dielectric block with links forms a series of planes and the microelectronic circuit element is a metal serpentine resistor suitable for use as a microelectronic fuse. 13. A method of making a microelectronic circuit element, the method comprising: forming a metal block; patterning the metal block with an array of openings; patterning the metal block with links to connect selected ones of the array of openings to form a geometrical shape; filling the openings and the links with a dielectric material; and planarizing the array. 14. The method of claim 13 wherein the patterning the metal with links includes forming a spiral coil and the circuit element is an inductor. 15. The method of claim 13 wherein the patterning the metal with links forms a series of planes and the circuit element is a metal serpentine resistor suitable for use as a microelectronic fuse. 16. A microelectronic device comprising: a dielectric layer; an array of metal columns in the dielectric layer; a plurality of metal links coupling a selected number of adjacent metal columns in a spiral configuration to form a continuous planar metal coil, a length of the spiral configuration determining an inductance of the device; a first contact pad coupled to a first end of the metal coil; and a second contact pad coupled to a second end of the metal coil. 17. The microelectronic device of claim 16 further comprising: a metal liner between the dielectric layer and the metal columns and between the dielectric layer and the metal links. 18. The microelectronic device of claim 16 wherein the metal columns and the metal links are copper. 19. The microelectronic device of claim 16 wherein the dielectric columns are round cylinders. 20. The microelectronic device of claim 16 wherein the dielectric columns are square cylinders.

Assignees

Inventors

Classifications

  • Inductive arrangements or effects of, or between, wiring layers · CPC title

  • Antifuses, i.e. interconnections changeable from non-conductive to conductive · CPC title

  • Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes · CPC title

  • H10W20/493Primary

    Fuses, i.e. interconnections changeable from conductive to non-conductive · CPC title

  • Electricity · mapped topic

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9905511B2 cover?
Nanoscale efuses, antifuses, and planar coil inductors are disclosed. A copper damascene process can be used to make all of these circuit elements. A low-temperature copper etch process can be used to make the efuses and efuse-like inductors. The circuit elements can be designed and constructed in a modular fashion by linking a matrix of metal columns in different configurations and sizes. The …
Who is the assignee on this patent?
St Microelectronics Inc, IBM
What technology area does this patent fall under?
Primary CPC classification H10W20/493. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 27 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).