Method of extracting properties of a layer on a wafer
US-2024234216-A9 · Jul 11, 2024 · US
US9897552B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9897552-B2 |
| Application number | US-201514805439-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 21, 2015 |
| Priority date | Jul 21, 2014 |
| Publication date | Feb 20, 2018 |
| Grant date | Feb 20, 2018 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
An optical transformation module includes a light generator generating a parallel light beam to be incident onto a surface of an inspection object and changing a wavelength of the parallel light beam, and a rotating grating positioned on a path of the parallel light beam and rotatable by a predetermined rotation angle such that the parallel light beam is transformed according to the wavelength of the parallel light beam and the rotation angle of the rotating grating to have a desired incidence angle and a desired incidence position onto the surface of the inspection object.
Opening claim text (preview).
What is claimed is: 1. An optical measurement system, comprising: an optical transformation module configured to generate a parallel light beam to be incident onto a surface of an inspection object and adjust an incidence angle and an incidence position of the parallel light beam with respect to the surface; and a collector configured to collect a reflecting light beam from the surface of the inspection object, wherein the optical transformation module comprises: a light generator configured to generate the parallel light beam and change a wavelength of the parallel light beam; a rotating grating positioned on a path of the parallel light beam and configured to rotate by a rotation angle such that the parallel light beam is transformed, based on the wavelength of the parallel light beam and the rotation angle of the rotating grating, to have a desired incidence angle and a desired incidence position onto the surface of the inspection object; and a lens array through which the parallel light beam is incident onto the surface of the inspection object at the incidence angle and the incidence position, wherein the rotating grating has a central axis perpendicular to the light generator, wherein the rotating grating is further configured to rotate by the rotation angle around the central axis, and wherein the lens array comprises: a focusing lens positioned on a path of the parallel light beam passing through the rotating grating and configured to convert the parallel light beam into a converted convergent/divergent light beam; an objective lens positioned on a path of the converted convergent/divergent light beam and configured to convert again the converted convergent/divergent light beam into the parallel light beam, direct the parallel light beam to the inspection object at the incidence angle and the incidence position, and convert a light beam reflecting from the inspection object into a reflecting parallel light beam; and an ocular lens positioned on a path of the reflecting parallel light beam and configured to convert the reflecting parallel light beam into a reflecting light beam. 2. The optical measurement system of claim 1 , wherein the rotating grating comprises a plurality of regions which are arranged alternately in a direction and have different refractive indices respectively. 3. The optical measurement system of claim 1 , wherein the rotating grating comprises a plurality of regions which are arranged alternately in a direction and have different transmittances respectively. 4. The optical measurement system of claim 1 , wherein the rotating grating has a striped or grid pattern. 5. The optical measurement system of claim 1 , wherein the light generator comprises: a light source configured to generate a light and change a wavelength of the light; and a collimating lens positioned on a path of the light and configured to convert the light into the parallel light beam having the wavelength. 6. The optical measurement system of claim 1 , wherein the light generator comprises a laser source configured to generate a laser beam and changes a wavelength of the laser beam. 7. The optical measurement system of claim 1 , further comprising: a beam splitter which is positioned between the focusing lens and the objective lens and configured to reflect the convergent/divergent light beam passing through the focusing lens to the objective lens as the converted convergent/divergent light beam. 8. The optical measurement system of claim 7 , wherein the reflecting light beam has image information of the inspection object, and the collector comprises a charge coupled device (CCD) lens configured to collect the image information of the inspection object from the reflecting light beam.
Arrays (G02B3/02, G02B5/188 take precedence) · CPC title
by means of one or more diffracting elements · CPC title
Technical microscopes, e.g. for inspection or measuring in industrial production processes · CPC title
Semiconductor wafers (manufacturing processes per se of semiconductor devices implementing a measuring step H10P74/20) · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.