Cleaning composition

Patent metadata

Field	Value
Publication number	US-9873857-B2
Application number	US-201514972351-A
Country	US
Kind code	B2
Filing date	Dec 17, 2015
Priority date	Feb 16, 2015
Publication date	Jan 23, 2018
Grant date	Jan 23, 2018

Abstract

Provided is a cleaning composition, including, from about 0.01 weight % to about 10.0 weight % of a chelating agent, from about 0.01 weight to about 3.0 weight % of an organic acid containing a carboxyl group, from about 0.01 weight % to about 2.0 weight % of an inorganic acid, from about 1.0 weight % to about 15.0 weight % of an amine and water in an amount sufficient to bring the total weight of the cleaning composition to 100 weight %.

First claim

What is claimed is:

1. A cleaning composition, comprising:
about 0.01 weight % to about 10.0 weight % of a chelating agent;
about 0.01 weight % to about 3.0 weight % of an organic acid having a carboxyl group;
about 0.01 weight % to about 2.0 weight % of an inorganic acid, wherein the inorganic acid comprises nitric acid;
about 1.0 weight % to about 15.0 weight % of an amine, wherein the amine comprises at least one of 4-amino-2-methyl-5-diphosphomethylpyrimidine, 2-amino-2-methyl-3-hydroxy-(2-tetramethylsilane), and 2-amino-3-methylpyridine; and
water, wherein the total weight of the cleaning composition is 100 weight %.

2. The cleaning composition as claimed in claim 1 , wherein the cleaning composition has a pH of about 2 to about 5.

3. The cleaning composition as claimed in claim 1 , wherein the chelating agent comprises an amino acid.

4. The cleaning composition as claimed in claim 1 , wherein the chelating agent comprises at least one of a glycine, an ethylenediaminetetraacetic acid (EDTA) and a cyclohexanediaminetetraacetic acid (CDTA).

5. The cleaning composition as claimed in claim 1 , wherein the organic acid having the carboxyl group comprises at least one of a lactic acid, a lactic acid alkyl ester, an acetic acid, and an acetic acid alkyl ester.

6. The cleaning composition as claimed in claim 1 , wherein the cleaning composition is capable of being used in a process for cleaning a device comprising at least one of a copper layer and a silicon nitride layer.

7. The cleaning composition as claimed in claim 6 , wherein the cleaning composition removes an organic particle, an inorganic particle and a metal particle.

8. The cleaning composition as claimed in claim 6 , wherein the device is a semiconductor apparatus or a display device.

9. A cleaning composition, consisting of:
about 0.01 weight % to about 10.0 weight % of a chelating agent;
about 0.01 weight % to about 3.0 weight % of an organic acid having a carboxyl group;
about 0.01 weight % to about 2.0 weight % of an inorganic acid, wherein the inorganic acid comprises nitric acid;
about 1.0 weight % to about 15.0 weight % of an amine; and
water, wherein the total weight of the cleaning composition is 100 weight %.

10. The cleaning composition as claimed in claim 9 , wherein the chelating agent is glycine, ethylenediaminetetraacetic acid (EDTA), cyclohexanediaminetetraacetic acid (CDTA), or a combination thereof.

11. The cleaning composition as claimed in claim 9 , wherein the organic acid having the carboxyl group is lactic acid, lactic acid alkyl ester, an acetic acid, an acetic acid alkyl ester, or a combination thereof.

12. The cleaning composition as claimed in claim 9 , wherein the amine is 2-amino-2-methyl-1-propanol, 4-amino-2-methyl-5-diphosphomethylpyrimidine, 2-amino-2-methyl-3-hydroxy-(2-tetramethylsilane), 2-amino-3-methylpyridine, or a combination thereof.

Assignees

• Samsung Display Co Ltd
• Ltcam Co Ltd

Inventors

• Lee Dongeon
• Ju Jinho
• Woo Junhyuk
• Lee Seokho

Classifications

• H10P70/20 Primary

  Cleaning during device manufacture · CPC title

• C11D7/3245 Primary

  Aminoacids · CPC title

• C11D7/3209

  Amines or imines with one to four nitrogen atoms; Quaternized amines · CPC title

• C11D7/08

  Acids · CPC title

• C11D7/265

  Carboxylic acids or salts thereof · CPC title