Method for electroless metallization

US9863044B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9863044-B2
Application numberUS-201314042527-A
CountryUS
Kind codeB2
Filing dateSep 30, 2013
Priority dateSep 30, 2012
Publication dateJan 9, 2018
Grant dateJan 9, 2018

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  1. Title

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  2. Abstract

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A method for forming a polymerized film on a surface of a non-conductive material and subsequently forming an electroless metal plating film on the surface is described. The method includes the step of contacting the surface of the material with a solution including (A) an amine compound having at least two functional groups, where at least one of the functional groups is an amino group, and (B) an aromatic compound having at least one hydroxyl group on the aromatic ring.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for forming a metallic film on a surface of a material comprising: a) contacting the surface of the material with a solution comprising a free radical initiator; b) contacting the surface of the material with the free radical initiator with a solution consisting of (A) an amine compound selected from the group consisting of H 2 N—R 1 —NH 2   (formula 1a) wherein R 1 is selected from the group consisting of C 1 to C 24 linear or branched alkylene and aromatic alkylene; H 2 N—R 1 —NH—R 2 —NH 2   (formula 2a ) wherein R 1 and R 2 are selected independently from the group consisting of C 1 to C 24 linear or branched alkylene and aromatic alkylene; wherein R 1 , R 2 , and R 3 are selected independently from the group consisting of C 1 to C 20 linear or branched alkylene and aromatic alkylene; wherein R 1 , R 2 , and R 3 are selected independently from the group consisting of C 1 to C 20 linear or branched alkylene and aromatic alkylene; wherein R 1 , R 2 , R 3 , R 4 , and R 5 are selected independently from the group consisting of C 1 to C 16 linear or branched alkylene and aromatic alkylene; and wherein R 6 is selected from the group consisting of and; (B) a compound having a formula: wherein R 8 is selected from the group consisting of H, CH 3 , phenyl, CN, NO 2 , propanoic acid, ethylamine, formic acid and formaldehyde, R 9 and R 10 are independently selected from the group consisting of H and OH; (C) a medium of the solution is selected from the group consisting of water Reverse Osmosis water and de-ionized water, and (D) a buffer selected from the group consisting of K 2 HPO 4 /citric acid and H 3 BO 3 /KCl/NaOH; c) polymerizing the (A) compound and the (B) compound by Michael Addition on the surface of the material to form the polymerized film; d) applying an electroless metal plating bath to the surface of the material comprising the polymerized film; and e) conducting electroless metal plating on the material comprising the polymerized film. 2. The method according to claim 1 , wherein a mole ratio of the functional groups within (A) to the functional groups within (B) is from 10:1 to 1:10.

Assignees

Inventors

Classifications

  • C23C18/18Primary

    Pretreatment of the material to be coated · CPC title

  • Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating · CPC title

  • with use of organic or inorganic compounds other than metals, first · CPC title

  • using reducing agents · CPC title

  • Two or more layers only obtained by electroless plating · CPC title

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What does patent US9863044B2 cover?
A method for forming a polymerized film on a surface of a non-conductive material and subsequently forming an electroless metal plating film on the surface is described. The method includes the step of contacting the surface of the material with a solution including (A) an amine compound having at least two functional groups, where at least one of the functional groups is an amino group, and (B…
Who is the assignee on this patent?
Rohm & Haas Elect Mat
What technology area does this patent fall under?
Primary CPC classification C23C18/18. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 09 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).