Substrate liquid processing apparatus and method, and computer-readable recording medium with substrate liquid processing program recorded therein

Patent metadata

Field	Value
Publication number	US-9862007-B2
Application number	US-201514666896-A
Country	US
Kind code	B2
Filing date	Mar 24, 2015
Priority date	Apr 1, 2014
Publication date	Jan 9, 2018
Grant date	Jan 9, 2018

Abstract

Disclosed are a substrate liquid processing apparatus and method for performing a liquid processing on a substrate using a processing liquid, and a computer-readable recording medium with a substrate liquid processing program recorded therein. In the method, a first chemical liquid supply step is performed to supply a first chemical liquid from a first chemical liquid supply unit to a processing liquid storage unit, a first chemical liquid purifying step is performed to purify the first chemical liquid in a chemical liquid purifying unit, a second chemical liquid supply step is performed to supply a second chemical liquid from a second chemical liquid supply unit to the processing liquid storage unit, and a processing liquid supply step is performed to supply the processing liquid obtained by mixing the first and second chemical liquids from the processing liquid supply unit to substrate liquid processing units.

First claim

What is claimed is:

1. A substrate liquid processing apparatus comprising:
a substrate liquid processing unit configured to process a substrate disposed therein using a processing liquid;
a processing liquid storage unit configured to store the processing liquid;
a processing liquid supply unit configured to supply the processing liquid from the processing liquid storage unit to the substrate disposed in the substrate liquid processing unit;
a first chemical liquid supply unit configured to supply a first chemical liquid to the processing liquid storage unit;
a second chemical liquid supply unit configured to supply a second chemical liquid to the processing liquid storage unit;
a chemical liquid purifying unit configured to circulate and purify the first chemical liquid stored in the processing liquid storage unit; and
a control unit configured to control the processing liquid supply unit, the first chemical liquid supply unit, the second chemical liquid supply unit, and the chemical liquid purifying unit such that the first chemical liquid and the second chemical liquid are mixed together to produce the processing liquid,
wherein the chemical liquid purifying unit includes a chemical liquid purifying flow line directly connected to the processing liquid storage unit and a filter provided in the chemical liquid purifying flow line, and the first chemical liquid is circulated between the processing liquid storage unit and the chemical liquid purifying flow line using the filter,
wherein the processing liquid storage unit includes a first storage tank and a second storage tank, and
wherein the chemical liquid purifying unit includes a common first chemical liquid purifying flow line connected to the first and second storage tanks, and a second chemical liquid purifying flow line which diverges from the processing liquid supply unit and connects to the first and second storage tanks.

2. The substrate liquid processing apparatus of claim 1 , further comprising:
a heating unit configured to heat the processing liquid stored in the processing liquid storage unit,
wherein the control unit is configured to drive the heating unit after the second chemical liquid is supplied to the processing liquid storage unit by the second chemical liquid supply unit.

3. The substrate liquid processing apparatus of claim 2 , wherein the control unit is configured to produce the processing liquid by mixing the first chemical liquid with the second chemical liquid, after the second chemical liquid is supplied to the processing liquid storage unit but before the processing liquid is supplied to the substrate liquid processing unit, and
the control unit is configured to drive the heating unit while the processing liquid is being produced.

4. The substrate liquid processing apparatus of claim 3 , wherein the control unit is configured to supply the first chemical liquid to the processing liquid storage unit at least before a first predetermined timing counting from a timing when the heating unit is heated, the second chemical liquid is supplied to the processing liquid storage unit at least before a second predetermined timing counting from the timing when the heating unit is heated, and the processing liquid is supplied to the substrate liquid processing unit when the processing liquid is heated up to a predetermined temperature.

5. The substrate liquid processing apparatus of claim 1 , wherein the control unit is configured to purify the first chemical liquid for a length of time longer than a length of time from initiation of supplying the second chemical liquid to initiation of supplying the processing liquid to the substrate liquid processing unit.

6. The substrate liquid processing apparatus of claim 1 , wherein
the control unit is configured to supply the first chemical liquid, purify the first chemical liquid, and supply the second chemical liquid using the second storage tank while the processing liquid is supplied to the substrate liquid processing unit using the first storage tank, and
the control unit is configured to supply the processing liquid using the second storage tank after the processing liquid is supplied to the substrate liquid processing unit using the first storage tank.

7. The substrate liquid processing apparatus of claim 6 , wherein
while the processing liquid is supplied to the substrate liquid processing unit using the first storage tank, the control unit circulates a purified processing liquid through the second chemical liquid purifying flow line and purifies the first chemical liquid stored in the second storage tank through the first chemical liquid purifying flow line.

8. The substrate liquid processing apparatus of claim 6 , wherein the control unit supplies the processing liquid to the substrate liquid processing unit using the first storage tank,
after the processing liquid is supplied to the substrate liquid processing unit using the first storage tank, the control unit discharges the processing liquid stored in the first storage tank and then supplies the first chemical liquid to the first storage tank, and
the control unit supplies the second chemical liquid to the first storage tank ahead of supplying the processing liquid to the first storage tank by a predetermined length of time ahead of the supplying of the processing liquid to the first storage tank.

9. A method of performing a liquid processing on a substrate using a processing liquid, the method comprising:
supplying a first chemical liquid to a storage unit;
providing a chemical liquid purifying flow line directly connected to the storage unit and a filter in the chemical liquid purifying flow line;
providing a chemical liquid purifying unit to circulate the first chemical liquid between the storage unit and the chemical liquid purifying flow line using the filter, thereby purifying the first chemical liquid;
supplying a second chemical liquid to the storage tank;
producing the processing liquid by mixing the first chemical liquid and the second chemical liquid; and
supplying a processing liquid supply unit to supply the processing liquid from the storage unit to the substrate;
wherein the storage unit includes a first storage tank and a second storage tank, and
wherein the chemical liquid purifying unit includes a common first chemical liquid purifying flow line connected to the first and second storage tanks, and a second chemical liquid purifying flow line which diverges from the processing liquid supply unit and connects to the first and second storage tanks.

10. The method of claim 9 , further comprising heating the processing liquid after the second chemical liquid is supplied to the storage tank.

11. The method of claim 10 ,
wherein the heating of the processing liquid is initiated while the processing liquid is being produced.

12. The method of claim 11 , wherein supplying the first chemical liquid to the storage tank is initiated at least before a first predetermined timing counting from a timing when the heating is initiated, supplying the second chemical liquid to the storage tank is initiated at least before a second predetermined timing counting from the timing when the heating is initiated, and the supplying the processing liquid to the substrate is initiated when the processing liquid is heated up to a predetermined temperature.

13. The method of claim 9 , wherein the purifying is executed for a length of time longer than a length of time from initiation of supplying the second chemical liquid to the storage tank to initiation of supplying the processing liquid to the substrate.

14. The method of claim 9 , wherein the fi

Assignees

• Tokyo Electron Ltd

Inventors

• Saiki Daisuke
• Mizota Shogo
• Yabuta Takashi
• Nonaka Jun
• Nagamatsu Tatsuya
• Tanaka Koji
• Maezono Tomiyasu

Classifications

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• B01D37/04

  Controlling the filtration · CPC title

• B01D36/04

  Combinations of filters with settling tanks · CPC title

• B08B3/14 Primary

  Removing waste, e.g. labels, from cleaning liquid · CPC title

• C11D11/0047

  Chemistry & Metallurgy · mapped topic