System and method for laser cutting sapphire using multiple gas media

US9844833B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9844833-B2
Application numberUS-201414168285-A
CountryUS
Kind codeB2
Filing dateJan 30, 2014
Priority dateJan 30, 2014
Publication dateDec 19, 2017
Grant dateDec 19, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A system and a method for manufacturing a sapphire part. A sapphire substrate is obtained for performing a laser cutting operation. The sapphire substrate is cut along a cut profile using a laser and a first gas medium. The first gas medium is substantially comprised of an inert gas. The sapphire substrate is then irradiated at or near the cut profile using the laser and a second gas medium. The second gas medium is different than the first gas medium comprising oxygen.

First claim

Opening claim text (preview).

We claim: 1. A method of manufacturing a sapphire part comprising: cutting the sapphire substrate along a cut profile using a laser and a first gas medium that is substantially comprised of an inert gas, wherein the cutting produces a darkened tint on the sapphire substrate near the cut profile; and irradiating the sapphire substrate near the cut profile using the laser and a second gas medium that is different than the first gas medium and comprises at least 15% oxygen by volume to reduce a darkness of the darkened tint by oxidizing the darkened tint. 2. The method of manufacturing the sapphire part of claim 1 , further comprising: separating the sapphire part from the sapphire substrate; performing a final cut on the sapphire substrate using the laser resulting in the separation of the sapphire part from the sapphire substrate, wherein the final cut is performed after the sapphire substrate has been irradiated using the second gas medium. 3. The method of manufacturing the sapphire part of claim 1 , further comprising: performing a final cut on the sapphire substrate using the laser resulting in a separation of the sapphire part from the sapphire substrate, wherein the final cut is performed before the sapphire substrate has been irradiated using the second gas medium. 4. The method of manufacturing the sapphire part of claim 1 , wherein the irradiating using the second gas medium is performed at an irradiation laser power that is less than a cutting laser power used for cutting the sapphire substrate using the first gas medium. 5. The method of manufacturing the sapphire part of claim 4 , wherein the cutting laser power is less than 950 watts and the irradiating laser power is at least 500 watts less than the cutting laser power. 6. The method of manufacturing the sapphire part of claim 1 , wherein a final cut is performed using a final-cut laser power that is greater than a cutting laser power used for cutting the sapphire substrate using the first gas medium. 7. The method of manufacturing the sapphire part of claim 1 , wherein the inert gas is nitrogen gas. 8. The method of manufacturing the sapphire part of claim 1 , wherein cutting the sapphire substrate along the cut profile comprises: melting a portion of the sapphire substrate along the cut profile using the laser; and removing the portion of the sapphire substrate along the cut profile by blowing a stream of the first gas medium on the portion of the sapphire substrate that has been melted. 9. The method of manufacturing the sapphire part of claim 1 , wherein irradiating the sapphire substrate along the cut profile comprises: heating a portion of the sapphire substrate along the cut profile using the laser; and immersing the portion of the sapphire substrate being heated in the second gas medium. 10. The method of manufacturing the sapphire part of claim 1 , wherein the sapphire substrate comprises a laminate structure having multiple layers and at least one layer made from sapphire. 11. The method of manufacturing the sapphire part of claim 1 , wherein the first gas medium comprises at least 99% inert gas by volume. 12. A method of manufacturing a sapphire part comprising: irradiating the sapphire substrate along a first cut profile using a laser and an inert gas to produce a molten sapphire and a darkened region along the first cut profile; removing the molten sapphire along the first cut profile using the inert gas; irradiating the sapphire substrate along a second cut profile using the laser and a second gas media, wherein: the second gas media is different than the first gas media, the second gas media comprises at least 15% oxygen by volume, the second cut profile is offset from the first cut profile, and the second gas media promotes an oxidation reaction at the second cut profile, the oxidation reaction to reduce a darkness of the darkened region the first cut profile; and separating the sapphire part from the sapphire substrate. 13. The method of manufacturing the sapphire part of claim 12 , further comprising: performing a final cut on the sapphire substrate using the laser resulting in the separation of the sapphire part from the sapphire substrate, wherein the final cut is performed after the sapphire substrate has been irradiated along the second cut profile. 14. The method of manufacturing the sapphire part of claim 12 , further comprising: performing a final cut on the sapphire substrate using the laser resulting in the separation of the sapphire part from the sapphire substrate, wherein the final cut is performed before the sapphire substrate has been irradiated along the second cut profile. 15. The method of manufacturing the sapphire part of claim 12 , wherein the irradiation along the first cut profile is done at a first laser power that is greater than the irradiation along the second cut profile done at a second laser power. 16. The method of manufacturing the sapphire part of claim 12 , wherein irradiating the sapphire substrate along the first cut profile comprises: melting a portion of the sapphire substrate along the first cut profile using the laser; and removing the portion of the sapphire substrate by blowing a stream of the first gas medium on the portion of the sapphire substrate that has been melted. 17. The method of manufacturing the sapphire part of claim 12 , wherein irradiating the sapphire substrate along the second cut profile comprises: heating a portion of the sapphire substrate along the second cut profile using the laser; and immersing the portion of the sapphire substrate that has been heated in the second gas medium. 18. A method of manufacturing a portable electronic device comprising: obtaining a sapphire part, the sapphire part formed by: obtaining a sapphire substrate; irradiating the sapphire substrate along a cut profile using a laser and a first gas media that is substantially comprised of an inert gas, wherein a tinted region along the cut profile is created; and irradiating the sapphire substrate along the cut profile using the laser and a second gas media, wherein: the second gas media is different than the first gas media and comprises at least 15% oxygen by volume; the second gas media promotes an oxidization reaction within the tinted region to lighten a color of the tinted region separating the sapphire part from the sapphire substrate; and attaching the sapphire part to an external face of the portable electronic device. 19. The method of manufacturing the portable electronic device of claim 18 , wherein the portable electronic device is any one of: a mobile telephone, a portable media player, a wearable device, or a tablet computing device. 20. The method of manufacturing the portable electronic device of claim 18 , wherein the first gas medium comprises at least 99% inert gas by volume. 21. A system for producing a sapphire part, the system comprising: a gas delivery device, wherein the gas delivery device is configured to provide a stream of gas to a portion of a sapphire substrate that is irradiated by a laser beam; and a laser configured to produce the laser beam incident on the portion of the sapphire substrate, wherein the laser is further configured to: irradiate the sapphire substrate along a cut profile while a first gas medium is provided by the gas delivery device that is substantially comprised of an inert gas, wherein a darkened region is produced along the cut profile; and irradiate the sapphire subs

Assignees

Inventors

Classifications

  • wherein at least one of the layers is non-metallic · CPC title

  • Inorganic materials other than metals or composite materials · CPC title

  • B23K26/125Primary

    of mixed gases · CPC title

  • for the removal of by-products · CPC title

  • by boring or cutting · CPC title

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What does patent US9844833B2 cover?
A system and a method for manufacturing a sapphire part. A sapphire substrate is obtained for performing a laser cutting operation. The sapphire substrate is cut along a cut profile using a laser and a first gas medium. The first gas medium is substantially comprised of an inert gas. The sapphire substrate is then irradiated at or near the cut profile using the laser and a second gas medium. Th…
Who is the assignee on this patent?
Apple Inc
What technology area does this patent fall under?
Primary CPC classification B23K26/125. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Dec 19 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).