Arrangement for actuating an element in a microlithographic projection exposure apparatus

Patent metadata

Field	Value
Publication number	US-9841682-B2
Application number	US-201715430086-A
Country	US
Kind code	B2
Filing date	Feb 10, 2017
Priority date	Jan 24, 2013
Publication date	Dec 12, 2017
Grant date	Dec 12, 2017

Abstract

The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (n R ) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (n A ) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (n A ) is greater than the first number (n R ). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.

First claim

The invention claimed is:

1. An arrangement configured to actuate an optical element of a microlithographic projection exposure apparatus, the optical element configured so that an adjustable force is transmittable to the optical element in a first number of degrees of freedom, the arrangement comprising:
a second number of actuators;
wherein:
the second number is greater than the first number;
for each of the second number of actuators, the actuator is coupled to the optical element via a mechanical coupling to transmit force to the optical element;
the optical element is actively deformable to compensate for an undesirable disturbance in the projection exposure apparatus;
each of the second number of actuators is configured to actively deform the optical element without changing a position of the optical element; and
each actuator in the arrangement is configured to actively deform the optical element without changing a position of the optical element.

2. The arrangement of claim 1 , wherein at least one of the second number of actuators is arranged at a node of at least one natural vibration mode of the optical element.

3. The arrangement of claim 1 , wherein the second number of actuators are configured so that they do not excite a bending mode of the optical element.

4. The arrangement of claim 1 , wherein at least one actuator is a Lorentz actuator.

5. The arrangement of claim 1 , wherein the first number is at least three.

6. The arrangement of claim 1 , wherein the first number is six.

7. The arrangement of claim 1 , wherein the optical element comprises a mirror.

8. The arrangement of claim 1 , further comprising the optical element.

9. An apparatus, comprising:
an optical element; and
an arrangement configured to actuate the optical element, the optical element configured so that an adjustable force is transmittable to the optical element in a first number of degrees of freedom, the arrangement comprising a second number of actuators;
wherein:
the second number is greater than the first number;
for each of the second number of actuators, the actuator is coupled to the optical element via a mechanical coupling to transmit force to the optical element;
the optical element is actively deformable to compensate for an undesirable disturbance in the projection exposure apparatus;
each of the second number of actuators is configured to actively deform the optical element without changing a position of the optical element;
each actuator in the arrangement is configured to actively deform the optical element without changing a position of the optical element; and
the apparatus is a microlithographic projection exposure apparatus.

10. An arrangement, comprising:
a deformable optical element configured so that an adjustable force is transmittable to the deformable optical element in a first number of degrees of freedom, the deformable optical element being actively deformable by actuators;
a second number of actuators, each actuator being coupled to the deformable optical element via a mechanical coupling to transmit a force to the deformable optical element in at least one of the degrees of freedom, the second number being greater than the first number; and
a controller configured to drive the second number of actuators based on a static transformation matrix and a driving signal for the deformation of the deformable optical element,
wherein the elements of the static transformation matrix are such that each of the actuators of the arrangement do not actuate:
a) translational rigid-body degrees of freedom of the deformable optical element; and
b) rotational rigid-body degrees of freedom of the deformable optical element.

11. The arrangement of claim 10 , wherein at least one of the actuators is arranged at a node of at least one natural vibration mode of the deformable optical element.

12. The arrangement of claim 10 , wherein the actuators are configured so that actuation in the degrees of freedom is substantially orthogonal to at least one natural vibration mode of the deformable optical element.

13. The arrangement of claim 10 , wherein the deformable optical element is actively deformable to compensate for a disturbance.

14. The arrangement of claim 10 , wherein the deformable optical element is a deformable mirror.

15. The arrangement of claim 10 , wherein at least one of the actuators comprises a Lorentz actuator.

16. The arrangement of claim 10 , wherein the first number is at least three.

17. The arrangement of claim 10 , wherein the first number is six.

18. The arrangement of claim 10 , wherein the arrangement is configured so that the optical element is actively deformable via the adjustable force.

19. The arrangement of claim 10 , wherein the elements of the static transformation matrix are such that the second number of actuators do not excite a bending mode of the deformable optical element.

20. An apparatus, comprising:
an optical element; and
an arrangement, comprising:
a deformable optical element configured so that an adjustable force is transmittable to the deformable optical element in a first number of degrees of freedom, the deformable optical element being actively deformable by actuators;
a second number of actuators, each actuator being coupled to the deformable optical element via a mechanical coupling to transmit a force to the deformable optical element in at least one of the degrees of freedom, the second number being greater than the first number; and
a controller configured to drive the second number of actuators based on a static transformation matrix and a driving signal for the deformation of the deformable optical element,

wherein:
the apparatus is a microlithographic projection exposure apparatus; and
the elements of the static transformation matrix are such that each of the actuators of the arrangement do not actuate:
a) translational rigid-body degrees of freedom of the deformable optical element; and
b) rotational rigid-body degrees of freedom of the deformable optical element.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Bleidistel Sascha
• Schoenhoff Ulrich
• Fischer Juergen

Classifications

• G03F7/70308

  Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift · CPC title

• G02B7/181

  with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation · CPC title

• G03F7/70233

  Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems · CPC title

• G03F7/70825

  Mounting of individual elements, e.g. mounts, holders or supports (workpiece or mask holders G03F7/707) · CPC title

• G03F7/709

  Vibration, e.g. vibration detection, compensation, suppression or isolation · CPC title