Arrangement for actuating an element in a microlithographic projection exposure apparatus

Patent metadata

Field	Value
Publication number	US-9568837-B2
Application number	US-201514818507-A
Country	US
Kind code	B2
Filing date	Aug 5, 2015
Priority date	Jan 24, 2013
Publication date	Feb 14, 2017
Grant date	Feb 14, 2017

Abstract

The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (n R ) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (n A ) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (n A ) is greater than the first number (n R ). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.

First claim

The invention claimed is:

1. An arrangement configured to actuate an optical element of a microlithographic projection exposure apparatus, the optical element configured so that an adjustable force is transmittable to the optical element in a first number of degrees of freedom, the arrangement comprising:
a second number of actuators;
wherein:
the second number is greater than the first number;
for each of the second number of actuators, the actuator is coupled to the optical element via a mechanical coupling to transmit force to the optical element;
the optical element is actively deformable to compensate for an undesirable disturbance in the projection exposure apparatus;
each of the second number of actuators is configured to actively deform the optical element; and
each of the second number of actuators is configured to control a position of the optical element.

2. The arrangement of claim 1 , wherein at least one of the second number of actuators is arranged at a node of at least one natural vibration mode of the optical element.

3. The arrangement of claim 1 , wherein the second number of actuators are configured so that they do not excite a bending mode of the optical element.

4. The arrangement of claim 1 , further comprising a third number of sensor elements configured to determine: a) a location of the optical element; and/or b) the position of the optical element.

5. The arrangement of claim 3 , wherein the third number is greater than the first number.

6. The arrangement of claim 1 , wherein at least one actuator is a Lorentz actuator.

7. The arrangement of claim 1 , wherein the first number is at least three.

8. The arrangement of claim 1 , wherein the first number is six.

9. The arrangement of claim 1 , wherein the optical element comprises a mirror.

10. The arrangement of claim 1 , further comprising the optical element.

11. The arrangement of claim 1 , wherein the microlithographic projection exposure apparatus is an EUV microlithographic projection exposure apparatus.

12. An apparatus, comprising:
an optical element; and
an arrangement configured to actuate the optical element, the optical element configured so that an adjustable force is transmittable to the optical element in a first number of degrees of freedom, the arrangement comprising a second number of actuators;
wherein:
the second number is greater than the first number;
for each of the second number of actuators, the actuator is coupled to the optical element via a mechanical coupling to transmit force to the optical element;
the optical element is actively deformable to compensate for an undesirable disturbance in the projection exposure apparatus;
each of the second number of actuators is configured to actively deform the optical element;
each of the second number of actuators is configured to control a position of the optical element; and
the apparatus is a microlithographic projection exposure apparatus.

13. The apparatus of claim 12 , wherein the microlithographic projection exposure apparatus is an EUV microlithographic projection exposure apparatus.

14. The apparatus of claim 12 , wherein the apparatus comprises an illumination device and a projection device.

15. The apparatus of claim 14 , wherein the projection device comprises the optical element and the arrangement.

16. The apparatus of claim 14 , wherein the illumination device comprises the optical element and the arrangement.

17. The apparatus of claim 14 , wherein the optical element comprises a mirror.

18. The apparatus of claim 14 , wherein at least one of the second number of actuators is arranged at a node of at least one natural vibration mode of the optical element.

19. The apparatus of claim 14 , wherein the second number of actuators are configured so that they do not excite a bending mode of the optical element.

20. The apparatus of claim 14 , wherein the first number is six.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Bleidistel Sascha
• Schoenhoff Ulrich
• Fischer Juergen

Classifications

• G03F7/70191 Primary

  Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like · CPC title

• G03F7/709

  Vibration, e.g. vibration detection, compensation, suppression or isolation · CPC title

• G02B7/185

  with means for adjusting the shape of the mirror surface · CPC title

• G03F7/70266

  Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction · CPC title

• G03F7/70233

  Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems · CPC title