Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film

Patent metadata

Field	Value
Publication number	US-9828457-B2
Application number	US-201414906050-A
Country	US
Kind code	B2
Filing date	Jun 12, 2014
Priority date	Jul 19, 2013
Publication date	Nov 28, 2017
Grant date	Nov 28, 2017

Abstract

Provided is a compound containing a phenolic hydroxy group which has excellent heat resistance, a resist composition which has excellent thermal decomposition resistance, optical sensitivity and resolution, and a composition for a resist underlayer coating which has excellent thermal decomposition resistance and dry etching resistance. The compound containing a phenolic hydroxy group has a molecular structure represented by Structural Formula (1) below:

wherein R 1 is a hydrogen atom, an alkyl group or an aryl group, n is an integer of 2 to 10, R 2 is any one of an alkyl group, an alkoxy group, an aryl group, an aralkyl group and a halogen atom, m is an integer of 0 to 4, and when m is 2 or greater, a plurality of R 2 's may be the same as or different from each other and may be bonded to either one of two aromatic rings of the naphthylene skeleton.

First claim

The invention claimed is:

1. A calix[2-10]arene compound which is obtained by reacting a 1,6-dihydroxynaphthalene compound with formaldehyde in the presence of a basic catalyst; wherein the 1,6-dihydroxynaphthalene is unsubstituted or substituted by any of alkyl, alkoxy, aryl, aralkyl or halogen.

2. A photosensitive composition comprising the calix[2-10]arene compound according to claim 1 and a photosensitizer.

3. A resist coating formed by coating the photosensitive composition of claim 2 .

4. A curable composition comprising the calix[2-10]arene compound according to claim 1 and a curing agent.

5. A cured product obtained by curing the curable composition of claim 4 .

6. A resist underlayer coating formed by coating and curing the curable composition of claim 4 .

7. A calix[2-10]arene compound which is obtained by reacting a 1,6-dihydroxynaphthalene compound with an aliphatic aldehyde compound having 2 or more carbon atoms or an aromatic aldehyde compound, in the presence of an acid catalyst; wherein the 1,6-dihydroxynaphthalene is unsubstituted or substituted by any of alkyl, alkoxy, aryl, aralkyl or halogen.

8. A photosensitive composition comprising the calix[2-10]arene compound according to claim 4 and a photosensitizer.

9. A resist coating formed by coating the photosensitive composition of claim 8 .

10. A curable composition comprising the calix[2-10]arene compound according to claim 7 and a curing agent.

11. A cured product obtained by curing the curable composition of claim 10 .

12. A resist underlayer coating formed by coating and curing the curable composition of claim 10 .

Assignees

• Dainippon Ink & Chemicals

Inventors

• Imada Tomoyuki
• Sato Yusuke
• Kimoto Seiji

Classifications

• C07C2603/92

  with a condensed ring system consisting of at least two mutually uncondensed aromatic ring systems, linked by an annular structure formed by carbon chains on non-adjacent positions of the aromatic system, e.g. cyclophanes · CPC title

• C09D161/12

  with polyhydric phenols · CPC title

• C08G8/04

  of aldehydes · CPC title

• G03F7/0236

  Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins · CPC title

• C08G8/20 Primary

  with polyhydric phenols · CPC title