Copolymer, resin composition containing the copolymer, film and phase difference film

Patent metadata

Field	Value
Publication number	US-9815927-B2
Application number	US-201514884281-A
Country	US
Kind code	B2
Filing date	Oct 15, 2015
Priority date	Oct 16, 2014
Publication date	Nov 14, 2017
Grant date	Nov 14, 2017

Abstract

A copolymer includes a fumaronitrile residue represented by following General Formula I and an aromatic vinyl monomer residue represented by following General Formula II:

wherein, in General-Formula II, R 1 is a hydrogen atom, a methyl-group or a phenyl-group, and R 2 is a hydrogen atom or a substituted or unsubstituted aryl-group having 6 to 12 carbon atoms, and each of R 3 , R 4 , R 5 , R 6 and R 7 independently represents a hydrogen atom, a halogen atom, a hydroxy-group, an alkoxy-group having 1 to 4 carbon atoms, an acyloxy-group having 2 to 5 carbon atoms, a cyanomethyl-group, or an alkyl-group having 1 to 8 carbon atoms, and at least two of R 2 , R 3 and R 4 may be bonded to form a ring, and at least two of arbitrary substituents of R 3 , R 4 , R 5 , R 6 and R 7 may be bonded to form a ring.

First claim

What is claimed is:

1. A copolymer comprising:
a fumaronitrile residue represented by following General Formula I; and
an aromatic vinyl monomer residue represented by following General Formula II:

wherein, in General Formula II, R 1 is a hydrogen atom, a methyl group or a phenyl group, and R 2 is a hydrogen atom or a substituted or unsubstituted aryl group having 6 to 12 carbon atoms, and each of R 3 , R 4 , R 5 , R 6 and R 7 independently represents a hydrogen atom, a halogen atom, a hydroxy group, an alkoxy group having 1 to 4 carbon atoms, an acyloxy group having 2 to 5 carbon atoms, a cyanomethyl group, or an alkyl group having 1 to 8 carbon atoms, and at least two of R 2 , R 3 and R 4 may be bonded to form a ring, and at least two of arbitrary substituents of R 3 , R 4 , R 5 , R 6 and R 7 may be bonded to form a ring,
wherein a content of the fumaronitrile residue is in the range of 40 to 55 mol % when a total of the content of the fumaronitrile residue and a content of the aromatic vinyl monomer residue is 100 mol %.

2. The copolymer, as defined in claim 1 , wherein the weight-average molecular weight of the copolymer ranges from 150,000 to 2,000,000.

3. The copolymer, as defined in claim 2 , wherein the weight-average molecular weight of the copolymer ranges from 200,000 to 1,500,000.

4. The copolymer, as defined in claim 3 , wherein the weight-average molecular weight of the copolymer ranges from 300,000 to 1,500,000.

5. The copolymer, as defined in claim 1 , wherein the content of the fumaronitrile residue is in the range of 40 to 51 mol %.

6. The copolymer, as defined in claim 1 ,
the copolymer further comprising an aliphatic vinyl monomer residue represented by following General Formula III,
wherein a content of aliphatic vinyl monomer residue represented by following General Formula III is in the range of 1 to 40 mol % when a total of a content of the fumaronitrile residue, a content of the aromatic vinyl monomer residue and a content of the aliphatic vinyl monomer residue is 100 mol %:

wherein, in General Formula III, R 8 is a hydrogen atom or a methyl group, R 9 is a cyano group, an alkoxy group having 1 to 8 carbon atoms, an alkoxycarbonyl group having 1 to 12 carbon atoms, an alkylaminocarbonyl group having 1 to 8 carbon atoms, or an alkylcarbonylamino group having 1 to 8 carbon atoms.

7. The copolymer, as defined in claim 1 , wherein R 1 and R 2 in General Formula II are hydrogen atoms.

8. A resin composition comprising:
the copolymer, as defined in claim 1 .

9. A film obtained by forming the film from the resin composition, as defined in claim 8 .

10. A phase difference film including a film obtained by stretching the film defined in claim 9 .

Assignees

• Fujifilm Corp

Inventors

• Nozoe Yutaka
• Takada Ryosuke

Classifications

• G02B5/3083

  Birefringent or phase retarding elements (G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001) · CPC title

• C08J5/18

  Manufacture of films or sheets · CPC title

• C08J2325/12

  with unsaturated nitriles · CPC title

• C08F212/10 Primary

  with nitriles · CPC title

• G02F1/134363

  for applying an electric field parallel to the substrate, i.e. in-plane switching [IPS] · CPC title